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首页> 外文期刊>Journal of Electronic Materials >Tunnel Dielectric Field-Effect Transistors with High Peak-to-Valley Current Ratio
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Tunnel Dielectric Field-Effect Transistors with High Peak-to-Valley Current Ratio

机译:具有高峰谷电流比的隧道介电场效应晶体管

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摘要

We present silicon-compatible tunnel dielectric field-effect transistors with strong negative differential resistance. On-state tunneling currents have been improved and fully suppressed ambipolarity with lowest subthreshold slope (SS) 10 mV/dec. In addition to the TFET mode, our device works as the negative transconductance characteristic that produces a high current peak-to-valley current ratio (PVR) (up to 10(7)). Numerical simulations demonstrate the impact of tunnel dielectric layer thickness, gate oxide thickness and temperature on the PVR. With the significant improvement in SS, on-state current and high PVR, this tunnel dielectric transistor provides an effective technique for enhancing the drive current, and realizes its applications in logic and memory circuits.
机译:我们呈现硅兼容的隧道介电场效应晶体管,具有强负差分电阻。 在状态隧道电流已经得到改善和完全抑制了具有最低亚多拉德斜率(SS)10 MV / DEC的实体。 除了TFET模式之外,我们的设备还配有产生高电流峰值电流比(PVR)的负跨导特性(高达10(7))。 数值模拟表明隧道介电层厚度,栅极氧化物厚度和温度对PVR的影响。 随着SS,导通电流和高PVR的显着改进,该隧道电介质晶体管提供了一种用于增强驱动电流的有效技术,并在逻辑和存储器电路中实现其应用。

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