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首页> 外文期刊>Journal of Electronic Materials >High Rate Growth of MOCVD-Derived GdYBCO Films Based on a Simple Self-Heating Method
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High Rate Growth of MOCVD-Derived GdYBCO Films Based on a Simple Self-Heating Method

机译:基于简单的自加热方法,MOCVD衍生的GDYBCO薄膜高速率生长

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摘要

The home-designed metal organic chemical vapor deposition (MOCVD) system was applied to prepare the Gd0.5Y0.5Ba2Cu3O7- (GdYBCO) films at a high deposition rate in order to improve the production efficiency and reduce the preparation cost of high temperature superconducting tapes. Based on a simple self-heating method, the distance between the shower head and the substrate surface can be reduced effectively to increase the concentration of metal organic sources on the substrate surface, which can commendably improve the deposition rate of GdYBCO films and the utilization ratio of metal organic sources. At last, the GdYBCO films were successfully prepared on the LaMnO3 template at the high deposition rate of 1m/min by the MOCVD process based on the simple self-heating method and the critical current (I-c) was more than 220A/cm-width (77K, 0 T), corresponding to the critical current density (J(c)) more than 4.4MA/cm(2) (77K, 0 T).
机译:施用家庭设计的金属有机化学气相沉积(MOCVD)系统以高沉积速率制备GD0.5Y0.5BA2CU3O7-(GDYBCO)薄膜,以提高生产效率,降低高温超导带的制备成本 。 基于简单的自加热方法,可以有效地减少淋浴头和基板表面之间的距离,以增加基板表面上的金属有机源的浓度,这可以表达地提高GDYBCO薄膜的沉积速率和利用率。 金属有机源。 最后,通过基于简单的自加热方法的MOCVD工艺,在LAMNO3模板上成功地在LAMNO3模板上成功准备了GDYBCO薄膜,并且临界电流(IC)大于220A / cm宽度( 77K,0 T),对应于临界电流密度(J(C))超过4.4mA / cm(2)(77K,0 T)。

著录项

  • 来源
    《Journal of Electronic Materials》 |2018年第12期|共7页
  • 作者单位

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Chengdu Fine Opt Engn Res Ctr Chengdu 610041 Peoples R China;

    Southwest Jiaotong Univ Sch Phys Sci &

    Technol Chengdu 610031 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Shanghai Univ Sch Phys Shanghai 200444 Peoples R China;

    Shanghai Univ Sch Phys Shanghai 200444 Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 计量学;材料;
  • 关键词

    High deposition rate; GdYBCO; MOCVD; self-heating; critical current density;

    机译:高沉积率;GDYBCO;MOCVD;自加热;临界电流密度;

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