首页> 外文期刊>Journal of Electronic Materials >Temperature and Interfacial Layer Effects on the Electrical and Dielectric Properties of Al/(CdS-PVA)/p-Si (MPS) Structures
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Temperature and Interfacial Layer Effects on the Electrical and Dielectric Properties of Al/(CdS-PVA)/p-Si (MPS) Structures

机译:温度和界面层对Al /(CDS-PVA)/ P-Si(MPS)结构的电气和介电性能的影响

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In the present study, cadmium sulphide (CdS) nanopowders were prepared by using a simple physical ball milling technique, and their x-ray diffraction (XRD) analysis confirmed the formation of hexagonal wurtzite structure of CdS. The morphology of CdS nanopowders was characterized by scanning electron microscope (SEM). Dielectric and electrical properties of the manufactured Al/(CdS-PVA)/p-Si (MPS) type structures were investigated by capacitance-voltage (C-V) and conductance-voltage (G/-V) measurements as functions of temperature and applied bias voltage at 500kHz. Some main parameters of the structure such as real and imaginary parts of complex dielectric constants, epsilon(=epsilon-j epsilon), loss tangent (tan), a.c. electrical conductivity (sigma(ac)), and real and imaginary parts of complex electric modulus, M*(=M+jM) of the structure were investigated in the temperature range between 230K and 340K. Ln(sigma(ac))-q/kT curve showed a linear behavior. The value of activation energy (E-a) was obtained as 0.0601eV at 5.0V from the slope of this curve. Moreover, argand diagrams of complex modulus were studied to determine relaxation process of these structures.
机译:在本研究中,通过使用简单的物理球铣削技术制备硫化镉(Cds)纳米粉末,其X射线衍射(XRD)分析证实了Cds的六边形紫立岩结构的形成。 CDS纳米粉红色的形态通过扫描电子显微镜(SEM)为特征。通过电容 - 电压(CV)和电导 - 电压(G / -V)测量作为温度和施加偏差的功能来研究制造的Al /(CDS-PVA)/ P-Si(MPS)型结构的介电和电性能500kHz的电压。结构的一些主要参数,如复杂介电常数的真实和虚部,epsilon(= epsilon-J epsilon),损失切线(Tan),A.C.在230K和340K之间的温度范围内研究了结构的电导率(Sigma(AC))和结构的复杂电模型的实数和虚部,M *(= M + JM)。 LN(Sigma(AC)) - Q / Kt曲线显示线性行为。从该曲线的斜率下,获得激活能量(E-A)的值为0.0601EV。此外,研究了复杂模量的Argand图以确定这些结构的松弛过程。

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