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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Electronic structure and chemical state analysis of nanoflowers decorated GaN and AlGaN/GaN heterostructure
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Electronic structure and chemical state analysis of nanoflowers decorated GaN and AlGaN/GaN heterostructure

机译:纳米轧机的电子结构和化学质态分析装饰GaN和Algan / GaN异质结构

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摘要

The present article reports electronic structure, chemical and defect states analysis of Quasi-continuous GaN film, nanoflowers decorated nanostructured GaN and nanoflowers decorated AlGaN/GaN hetero-structure. The nanostructured GaN and AlGaN surfaces were decorated with nanoflowers having a size variation between 200 and 400 nm. Extensive photoemission analysis was performed to analyse surface chemistry and electronic structure and their correlation with surface morphology. Indication of free electron accumulation was perceived by the observed downwards band bending at the interface of AlGaN/GaN heterostructure. The optical response inveterate defects minimization in nanoflower decorated GaN and AlGaN/GaN heterostructure and the presence of minimum residual stress. (C) 2017 Elsevier B.V. All rights reserved.
机译:本文报道了准连续GaN薄膜的电子结构,化学和缺陷状态分析,纳米割草装饰纳米结构GaN和纳米割草机装饰Algan / GaN杂结构。 纳米结构GaN和AlGaN表面装饰有纳米辊的尺寸在200和400nm之间的变化。 进行广泛的光映射分析,分析表面化学和电子结构及其与表面形态的相关性。 在AlGaN / GaN异质结构的界面处观察到的向下带弯曲感知自由电子积累的指示。 纳米λ造成的GaN和AlGaN / GaN异质结构中的光学响应缺陷最小化和最小残余应力的存在。 (c)2017年Elsevier B.V.保留所有权利。

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