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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Determination of valence and conduction band offsets in Zn0.98Fe0.02O/ZnO hetero-junction thin films grown in oxygen environment by pulsed laser deposition technique: A study of efficient UV photodetectors
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Determination of valence and conduction band offsets in Zn0.98Fe0.02O/ZnO hetero-junction thin films grown in oxygen environment by pulsed laser deposition technique: A study of efficient UV photodetectors

机译:脉冲激光沉积技术在氧环境中生长的Zn0.98Fe0.02O / ZnO杂连接薄膜中的价和传导偏移的测定:高效紫外线光电探测器的研究

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摘要

Here we present ZnO based thin films deposited in oxygen environment by pulsed laser deposition technique for UV photodetection applications. The valence and conduction band alignments are the key parameter required in understanding the type of charge carrier participating in conduction process. The valence and conduction band offset measurements have been carried out using the X-ray photoelectron spectroscopy (XPS) on the pristine ZnO, Fe (2 wt%) -doped ZnO (Zn0.98Fe0.02O) and the hetero-junction of Zn0.98Fe0.02O with ZnO (Zn0.98Fe0.02O/ZnO). XPS studies revealed that the valence band is upward shifted with 0.37 eV, whereas, there is a downward shifting of -0.393 eV in the conduction band. Structural analysis of the deposited films has been done using X-ray diffraction studies, which revealed the polycrystalline nature of all the films having wurtzite crystal phase. AFM studies suggest that the size of the grains decreases with Fe-doping in ZnO network due to different ionic radii of Zn and Fe. UV-Vis studies suggest the decrease in optical band gap with Fe-doping and hetero-junction formation. The optical band gap energy has also been obtained from the fitting of experimental data of absorption spectra with Mott-Davis's model and Hydrogenic excitonic model. Both the models are well corroborated with each other. The photoconduction behavior of the deposited films has been analyzed under UV light. The pristine ZnO film has a photoresponse of about 25% which is found to increase in Zn0.98Fe0.02O (similar to 36%) film. The responsivity values are found to be 1.56, 2.17 and 1.86 mA/W for the pristine ZnO, Zn0.98Fe0.02O and Zn0.98Fe0.02O/ZnO thin films, respectively. (c) 2018 Elsevier B.V. All rights reserved.
机译:在这里,我们通过用于UV光电探测应用,通过脉冲激光沉积技术呈现沉积在氧环境中的ZnO薄膜。价值和传导频带对准是理解参与导通过程的电荷载体类型所需的关键参数。使用X射线光电子谱(XPS)在原始ZnO,Fe(2wt%) - 掺杂的ZnO(Zn0.98Fe0.02O)和Zn0的异结合物中进行了价和导带偏移测量。 98Fe0.02O含ZnO(Zn0.98Fe0.02O / ZnO)等。 XPS研究表明,使用0.37eV的价带向上移动,而导通带中的向下移位为-0.393eV。使用X射线衍射研究进行了对沉积膜的结构分析,该研究揭示了具有均外晶相的所有薄膜的多晶性质。 AFM的研究表明,由于Zn和Fe的不同离子半径,ZnO网络中的Fe-Doping的粒度降低。 UV-VIS研究表明,具有Fe掺杂和异质结形成的光带间隙的降低。光带隙能量也从具有Mott-Davis模型和氢激发器模型的吸收光谱的实验数据的拟合来获得。两种模型彼此都很好。沉积的薄膜的光电通道进入行为已经在UV光下分析。原始ZnO膜具有约25%的光响应,该蛋白是Zn0.98Fe0.02O(类似于36%)薄膜的增加。对于原始ZnO,Zn0.98Fe0.02O和Zn0.98Fe0.02O / ZnO薄膜,分别发现响应值是1.56,2.17和1.86mA / W. (c)2018年elestvier b.v.保留所有权利。

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