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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Preparation and characterization of optical and electrical properties of copper selenide sulfide polycrystalline thin films
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Preparation and characterization of optical and electrical properties of copper selenide sulfide polycrystalline thin films

机译:硒化铜硫化铜多晶薄膜光学和电性能的制备与表征

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摘要

AbstractThe structural, optical and electrical properties of Cu1.8Se1-xSx(0.25?≤?x?≤?0.75) polycrystalline thin films deposited at room temperature by vacuum evaporation were studied as a function of composition. Energy dispersive X -ray analysis was used to determine the elemental composition of different films. Results indicate the incorporation of sulfur at the expense of selenium. X-ray diffraction analysis reveal that the (220) diffraction peak of the Cu1.8Se1-xSxfilms shifts to a higherwith an increase in the sulfur content. Atomic force microscopy images of the deposited films show dense and well-defined grains. Analysis of the absorption coefficient data show the existence of two optical transition mechanisms - direct transitions withEg-dirranging from 2.2 to 2.5?eV, and indirect transitions withEg-indirranging from 1.23 to 1.52?eV as the sulfur content was increased from 0.25 to 0.75, respectively. The Hall coefficient, Hall mobility, and electrical conductivity were measured at room temperature for different film compositions. All investigated films are highly degenerated p-type semiconductors with the number of free carriers up to 1020?cm?3. Combining the results of the optical and electrical measurements, the effective mass for the highly degenerate compositions is found to be 1.718 to 0.587 as the sulfur content varies from 0.25 to 0.75.Graphical abstractDisplay OmittedHighlights?Cu1.8Se1-xSxthin films are prepared by thermal evaporation.?Cu1.8SexS1-xfilms are formed in a single cubic phase.?Cu1.8Se become smoother when alloying with sulfur.?The direct bandgap can be tuned from 2.2 to 2.5?eV by adjusting sulfur content.]]>
机译:<![CDATA [ 抽象 Cu 1.8 se 1-x s x (0.25?≤? X / Ce:斜体>≤α.0.75)通过真空蒸发在室温下沉积的多晶薄膜作为组合物的函数。能量分散X射线分析用于确定不同膜的元素组成。结果表明硒掺入硒。 X射线衍射分析显示CU 1.8 SE 1-X S X 薄膜转移到更高的随着硫含量的增加。沉积薄膜的原子力显微镜图像显示致密且明确明确的晶粒。吸收系数数据分析显示了两个光学转换机制的存在 - 与 e g-dir 从2.2到2.5?ev,以及与 e g -indir 范围从1.23到1.52?硫含量分别从0.25增加到0.75。在室温下为不同薄膜组合物测量霍尔系数,霍尔迁移率和导电性。所有研究的薄膜都是高度退化的p型半导体,其自由载体的数量高达10 20 Δcm?3 。结合光学和电测量的结果,发现高度简并组合物的有效质量为1.718至0.587,因为硫含量从0.25到0.75变化。 图形抽象 显示省略 亮点 CU 1.8 SE 1-X S < CE:INF LOC =“POST”> X 薄膜通过热蒸发准备。 CU 1.8 SE x s 1-x 薄膜在单个立方相中形成。 CU 1.8 在用硫磺的合金化时变得更平滑。 直接带隙可以通过调整硫含量从2.2到2.5调谐。 ]]>

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