首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Effects of annealing treatment on microstructure, electrical and magnetodielectric properties of BiFe0.98Co0.02O3/Al-doped ZnO layered thin films prepared by chemical solution deposition
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Effects of annealing treatment on microstructure, electrical and magnetodielectric properties of BiFe0.98Co0.02O3/Al-doped ZnO layered thin films prepared by chemical solution deposition

机译:通过化学溶液沉积制备的BiFe0.98Co0.02O3 /掺杂ZnO层层薄膜的微观结构,电和磁电性能的影响

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摘要

Multiferroic thin films of BiFe0.98Co0.02O3 (BFCO) were grown on Al2O3 (ALO) substrates having a buffer layer of Al (2%) doped ZnO (ZAO) prepared by using chemical solution deposition (CSD) method. Effect of annealing temperature and annealing atmosphere on the structural, microstructural, dielectric, leakage, transport, magnetic and magnetodielectric (MD) properties of films have been investigated. BFCO/ZAO/ALO films grown under oxygen atmosphere show better crystallinity, smooth surface and slightly larger grain size than that of the films annealed in air. Lower leakage current, higher dielectric constant, lower dielectric loss, lower a.c. conductivity and larger MD and magnetoimpedance (MI) effects have been observed for the film annealed at 550 degrees C under oxygen atmosphere. In order to verify the state of oxygen vacancies, photoluminescence spectra have been studied. Room temperature magnetic behavior of the BFCO/ZAO/ALO films has been studied by performing magnetization measurements. The effect of magnetic field on the dielectric constant and impedance (MD & MI) have been discussed on the basis of magnetostriction effect and mobility of interfacial charges at grain boundaries and bilayer interface. (C) 2020 Elsevier B.V. All rights reserved.
机译:通过使用化学溶液沉积(CSD)方法制备的Al(2%)掺杂ZnO(ZaO)的缓冲层的Al 2 O 3(ALO)底物上生长BiFe0.98Co0.02O3(BFCO)的多体薄膜。研究了退火温度和退火气氛对薄膜的结构,微观结构,电介质,泄漏,运输,磁性和磁电二电(MD)性质的影响。在氧气气氛下生长的BFCO / ZAO / ALO薄膜显示出更好的结晶度,光滑的表面和略大的粒度,比在空气中退火的薄膜的粒度。漏电流较低,介电常数较高,介电损耗更低,较低A.C。在氧气气氛下,已经观察到在550℃下退火的薄膜的电导率和较大的MD和磁力减扣(MI)效应。为了验证氧空位状态,已经研究了光致发光光谱。通过进行磁化测量研究了BFCO / ZAO / ALO薄膜的室温磁性行为。磁性磁场对介电常数和阻抗(MD&MI)的影响已经基于磁致伸缩效应和晶界和双层界面的界面电荷的迁移率讨论。 (c)2020 Elsevier B.v.保留所有权利。

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