首页> 外文期刊>Dalton transactions: An international journal of inorganic chemistry >Highly flexible memristive devices based on MoS2 quantum dots sandwiched between PMSSQ layers
【24h】

Highly flexible memristive devices based on MoS2 quantum dots sandwiched between PMSSQ layers

机译:基于MOS2量子点夹在PMSSQ层之间的高度灵活的铭文

获取原文
获取原文并翻译 | 示例
           

摘要

This paper reports a facile, cost effective method that uses an aqueous hydrothermal process for synthesizing two-dimensional molybdenum disulphide (MoS2) monolayer quantum dots (QDs) and their potential applications in flexible memristive devices. High-resolution transmission electron microscopy and atomic force microscopy images confirmed that the diameters of the synthesized MoS2 QDs with irregular shapes were in the range between 3 and 6 nm; their thicknesses were confirmed to lie between 1.0 and 0.8 nm, a clear indication that a monolayer of MoS2 QDs had been synthesized. Photoluminescence (PL) and time-resolved PL spectra of the MoS2 QDs revealed a strong emission in the blue region with a slower decay constant. Memristive devices fabricated by incorporating MoS2 QDs between poly(methylsilsesquioxane) ultrathin layers, which had been deposited on poly(ethylene terephthalate), demonstrated a high ON-OFF current ratio of approximate to 10(4), stable retention, and excellent endurance in the relaxed state; these devices were also demonstrated to function properly during bending and in a bent state. The flexible memristive devices demonstrated an OFF state with a very low current of 10(-6) A. These results clearly show that ultrathin two-dimensional QDs have promising applications in high-performance flexible memristive devices.
机译:本文报道的简便,经济有效的方法,该方法的用途,用于合成二维二硫化钼(二硫化钼)的单层量子点(QD)以及它们在柔性忆阻器件的潜在应用的水性水热过程。高分辨透射电子显微镜和原子力显微镜图像确认合成的MoS 2的QD的直径具有不规则形状的均3和6纳米之间的范围内;它们的厚度被证实1.0和0.8纳米,这清楚地表明的MoS 2的QD的单层已经合成之间躺下。光致发光(PL)和二硫化钼的QD的时间分辨PL光谱显示在蓝色区域中具有较慢的衰变常数的强发射。忆阻器件制造通过将二硫化钼的QD聚(甲基倍半硅氧烷)的超薄层,已被沉积在聚(对苯二甲酸乙二醇酯)之间,表现出的近似至10(4)在高ON-OFF电流比,稳定地保持,以及优异的耐久性放松的状态;这些装置正常时的弯曲,并在弯曲的状态下也被证实的功能。柔性忆阻器件表现出了关断状态与图10(-6)A的非常低的电流。这些结果清楚地表明,超薄二维量子点具有高性能柔性忆阻器件有希望的应用程序。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号