机译:磁控溅射生长的二氧化钒薄膜的厚度调制热切割
Chinese Acad Sci Shanghai Inst Opt &
Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;
Chinese Acad Sci Shanghai Inst Opt &
Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;
Chinese Acad Sci Shanghai Inst Opt &
Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;
Chinese Acad Sci Shanghai Inst Opt &
Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;
Shenzhen Univ Coll Phys &
Energy Shenzhen Key Lab Adv Thin Film &
Applicat Shenzhen 518060 Peoples R China;
Shenzhen Univ Shenzhen 518060 Peoples R China;
Vanadium dioxide; Magnetron sputtering; Film thickness; Thermochromic performance;
机译:磁控溅射生长的二氧化钒薄膜的厚度调制热切割
机译:由高功率脉冲磁控溅射生长的钒和钒氮化膜
机译:氧气压力对磁控溅射生长的高(0 1 1)取向二氧化钒薄膜的金属-绝缘体转变特性的影响
机译:脉冲 - 磁控溅射制备热致铬钒薄膜
机译:用于微辐射热计应用的脉冲直流磁控溅射氧化钒薄膜的制备,表征和沉积后修饰
机译:射频磁控溅射在不同N2 / Ar气体流量下生长的Zn3N2薄膜的XPS深度剖面分析
机译:脉冲直流反应磁控溅射二氧化钒热致变色薄膜