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Deposition of superhydrophobic coatings on glass substrates from hexamethyldisiloxane using a kHz-powered plasma jet

机译:用KHz动力等离子体射流从六甲基二硅氧烷的玻璃基材上沉积超疏水涂层

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Deposition of superhydrophobic coatings on glass substrates from hexamethyldisiloxane (HMDSO) precursor using an argon plasma jet at a relatively low power frequency (11.5 kHz) was studied. The coating hydrophobicity was first found to be strongly dependent on the gaseous shield. Nitrogen (N-2) rather than inert gases (argon, Ar, and helium, He) had an excellent shielding effect against the interference of ambient air on the plasma jet. The evolution of water contact angle (WCA) of the prepared coating was investigated upon the variations of the operating parameters, such as N-2/Ar ratio, HMDSO concentration, deposition time and nozzleto-substrate distance. Generally, the measured WCA gradually increased with increasing the values of these parameters and then leveled off at some specific values, except for the nozzle-to-substrate distance. The wettability of glass was completely switched from hydrophilicity to superhydrophobicity with the WCA reaching 168 degrees and the sliding angle of about 3 degrees at optimum conditions. The surface morphology analyses by scanning electron microscopy (SEM) and atomic force microscopy (AFM) revealed that the prepared coating had a very high surface roughness and micro-nano structure, which intensely promoted the water repellence property. The chemical examination by X-ray photoelectron spectroscopy (XPS) clearly showed the shielding effect on the surface chemical composition of the coating. Na shield preserved a high carbon content (in CH3 groups) from the precursor, while minimizing the incorporation of oxygen into the coating surface. Also, it was found that O (from O and OH radicals) has replaced C to form silica-like coating in case of without shielding gas or with Ar and He shields.
机译:研究了在六甲基二硅氧烷(HMDSO)前体的玻璃基板上沉积超疏水涂层,使用氩等离子体射流以相对低的功率频率(11.5kHz)。首先发现涂层疏水性强烈依赖于气体屏蔽。氮(N-2)而不是惰性气体(氩气,Ar和氦气,He)对等离子体射流的环境空气的干涉具有优异的屏蔽效果。研究了制备涂层的水接触角(WCA)的演变,例如N-2 / Ar比,HMDSO浓度,沉积时间和喷射底物距离等变化。通常,测量的WCA随着这些参数的值而逐渐增加,然后在一些特定值下缩小,除了喷嘴到基板距离。将玻璃的润湿性完全从亲水性转换为超细侵害,WCA达到168度,并且在最佳条件下达到约3度的滑动角度。通过扫描电子显微镜(SEM)和原子力显微镜(AFM)的表面形态分析显示,制备的涂层具有非常高的表面粗糙度和微纳米结构,其强烈地促进了防水性能。通过X射线光电子能谱(XPS)的化学检查清楚地显示了对涂层表面化学成分的屏蔽效果。 Na Shield从前体保留了高碳含量(以CH3基团),同时最小化氧气掺入涂层表面。而且,发现O(来自O和OH基团)已更换C以在没有屏蔽气体或与AR和HE屏蔽的情况下形成二氧化硅样涂层。

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