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Characterization of ZrN coating low-temperature deposited on the preliminary Ar+ ions treated 2024 Al-alloy

机译:初步Ar +离子沉积的ZrN涂层低温沉积物的特征在于2024 Al合金

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The present paper considers the problem of the low-temperature deposition of the hard coatings on the alloys having a low melting point and a high affinity for oxygen, like aluminum or magnesium alloys. It is demonstrated that a hard ZrN coating can be produced on the 2024 aluminum alloy by the low-temperature vacuumarc deposition method. To achieve high adhesion strength between the coating and substrate, the substrate was sputtered by low-energy inert Ar+ ions before the deposition process in order to remove the natural oxide layer. The optimal technological regimes selected and used allowed obtaining the stoichiometric ZrN coating of extremely low roughness (0.061 mu m), uniform thickness (similar to 1 mu m) with nano-scale columnar microstructure with the cross-sectional size of the columnar grains of similar to 20-50 nm. The layered microstructure of the obtained coating respectively consisted of the columnar and V-shaped grains in the lower and upper layers comes to be in the 'transition zone' on the 'structure-zone diagram'. The lower layers consist of a number of AlxZry phases along with the Zr(3)N(4 )orthorhombic phase, while the outmost layer of the film contains the single ZrN fcc phase. In comparison with the substrate alloy, the produced ZrN coating is shown to possess the superior anti-corrosion properties in saline solution, a high hardness (similar to 20 GPa) and elastic modulus (196 GPa), high adhesion strength both at the progressively increased load and at cyclic dry sliding of the conical diamond indenter with the 50 mu m tip, low friction coefficients and high wear resistance at the reciprocating sliding both in the dry and wet (liquid paraffin) conditions against the conical diamond indenter with the 50 mu m tip and 8 mm Si3N4 ball, respectively.
机译:本文件上考虑具有低的熔点和对氧的亲和性高,象铝或镁的合金的合金的硬质涂层的低温沉积的问题。已经证明,一硬的ZrN涂层可以由所述低温vacuumarc蒸镀法,在2024铝合金来制造。为了实现涂层和基材之间的密合强度高,将基板通过低能量惰性的沉积工艺之前的Ar +离子,以去除自然氧化物层的溅射。选择和使用最佳工艺制度允许获得与具有类似的柱状晶粒的横截面尺寸的纳米级柱状微结构的化学计量的ZrN非常低粗糙度的涂层(0.061微米),厚度均匀(类似于1微米)到20-50纳米。所获得的分别涂覆层状显微组织由柱状的,并在下层与上层的V形的晶粒来在“结构区图”上的“过渡区”。下层由多个与所述的Zr(3)N(4)正交相沿AlxZry相的,而薄膜的最外层包含单的ZrN FCC相。在与基板的合金比较,所产生的的ZrN涂层被示出无论是在逐步增加至具有在盐溶液中,高硬度(类似于为20GPa)和弹性模量(196 GPa)的,高粘附强度的优良抗腐蚀性能负荷和循环干燥与50亩锥形金刚石压头的滑动中号尖端,低摩擦系数和高耐磨性的往复在干滑动既和润湿(液体石蜡)抵靠锥形金刚石压头的条件与50微米分别尖和8mm氮化硅球,。

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