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机译:离子磁通密度和能量对磁控溅射用阳极层离子源制备的锡薄膜组成的影响
City Univ Hong Kong Dept Phys Kowloon Tat Chee Ave Hong Kong Peoples R China;
Pakistan Inst Engn &
Appl Sci Dept Mat Engn Islamabad Pakistan;
City Univ Hong Kong Dept Phys Kowloon Tat Chee Ave Hong Kong Peoples R China;
City Univ Hong Kong Dept Phys Kowloon Tat Chee Ave Hong Kong Peoples R China;
City Univ Hong Kong Dept Phys Kowloon Tat Chee Ave Hong Kong Peoples R China;
City Univ Hong Kong Dept Phys Kowloon Tat Chee Ave Hong Kong Peoples R China;
City Univ Hong Kong Dept Phys Kowloon Tat Chee Ave Hong Kong Peoples R China;
City Univ Hong Kong Dept Phys Kowloon Tat Chee Ave Hong Kong Peoples R China;
Anode layer ion source; Magnetron sputtering; Titanium nitride; Oxygen concentration; Ion energy; Ion flux density; Resistivity;
机译:离子磁通密度和能量对磁控溅射用阳极层离子源制备的锡薄膜组成的影响
机译:磁控溅射以倾斜角度制备的多孔,坚固,高导电性的Ni-YSZ薄膜阳极,可用作固体氧化物燃料电池的阳极和缓冲层
机译:偏压对离子源辅助磁控溅射制备TiNx薄膜结构力学性能和耐蚀性的影响
机译:磁控溅射制备具有非常薄缓冲层的透明导电掺杂杂质的ZnO薄膜的电阻率降低
机译:通过直角磁控溅射制备的生物医学应用羟基磷灰石薄膜的表征。
机译:溶胶-凝胶法和磁控反应溅射制备Eu掺杂ZnO薄膜的结构性能与能量转移的相关性
机译:磁控溅射以倾斜角度制备的多孔,坚固,高导电性的Ni-YSZ薄膜阳极,可用作固体氧化物燃料电池的阳极和缓冲层