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Toward Graphene/Silicon Interface via Controlled Electrochemical Reduction of Graphene Oxide

机译:通过受控电化学还原石墨烯氧化物的石墨烯/硅界面

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摘要

A novel experimental approach to produce graphene/silicon interface is reported, which consists of electrochemically reduced graphene oxide directly in contact with Si(111). The utilized procedure makes use of differently concentrated graphene oxide solutions drop-casted onto a flat crystalline hydrogenated Si(111) surface. Such modified surface was utilized as a working electrode in an electrochemical cell with aqueous electrolyte and subject to cyclic voltammetry in different conditions. After the electrochemical treatments, the electrodes were characterized by means of field-emission scanning electron microscopy microscopy and Raman and X-ray photoelectron spectroscopies. The overall results demonstrate the transformation of graphene oxide into electrochemically reduced graphene oxide over the silicon surface, as evidenced by the abatement of the spectroscopic features associated with oxidized carbon groups and by the increase in the number of graphene-like sp(2) carbon domains. These outcomes are new and a step forward in the direction of an easy procedure to high quality graphene/silicon interfaces.
机译:报告了一种新的生产石墨烯/硅界面的实验方法,其由直接与Si(111)接触的电化学还原氧化物组成。利用方法利用不同浓缩的石墨烯氧化物溶液,将浇注到平坦的结晶氢化Si(111)表面上。这种改性表面用作具有水性电解质的电化学电池中的工作电极,并在不同的条件下受循环伏安法进行。在电化学处理之后,通过现场发射扫描电子显微镜显微镜和拉曼和X射线光电子谱表征电极。总体结果证明了石墨烯氧化物在硅表面上转化为电化学还原的石墨烯氧化物,如氧化碳基团相关的光谱特征的削减所证明的,并通过石墨烯SP(2)碳畴的数量增加。这些结果是新的,在高质量的石墨烯/硅接口方便过程中向前迈进。

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