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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Models of Surface Morphology and Electronic Structure of Indium Oxide and Indium Tin Oxide for Several Surface Hydroxylation Levels
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Models of Surface Morphology and Electronic Structure of Indium Oxide and Indium Tin Oxide for Several Surface Hydroxylation Levels

机译:几种表面羟基化水平的氧化铟和氧化铟锡的表面形态和电子结构模型

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Indium oxide (IO) and indium tin oxide (ITO) are important metal oxide materials with a wide array of applications. Particularly, ITO is employed as a transparent conductive electrode in photovoltaic systems. While bulk metal oxides are typically well characterized, their surfaces, especially in real-life applications, can be hydroxylated and intrinsically disordered to a level that a structure function prediction becomes a daunting task. We tackle this problem by carrying out simulations based on Density Functional Theory. We propose IO and ITO hydroxylated surfaces derived from the bcc and rombohedral IO polymorphs (100%, 66%, 33%, and 0% hydroxylation coverages were considered). By correlating computed quantities such as surface partial density of states, work functions, and surface dipole strength, a clear picture of the structure function relationships in these model systems emerges. In line with conclusions drawn from experiments, we find that the density of states of 100% hydroxylated surfaces and bulk models are unaltered by Sn doping, with the only difference being the position of the Fermi level. The partially hydroxylated surfaces, instead show a rich array of behaviors, including appearance of surface states in the gap and appearance of interesting morphologies, such as chemisorbed molecular oxygen. We also find that the hydroxylation level affects surface dipoles in a systematic way, that is, the higher the hydroxylation level, the higher the surface dipole (screening/reducing the work function). Furthermore, models with In-atom vacancies show a relatively small decrease in surface dipole with hydroxyl coverage due to surface distortions.
机译:氧化铟(IO)和氧化铟锡(ITO)是具有各种应用的重要金属氧化物材料。特别地,ITO在光伏系统中用作透明导电电极。虽然散装金属氧化物通常很好,但它们的表面,尤其是在现实寿命应用中,可以是羟基化的,并且本质上无序地达到结构功能预测成为艰巨任务的水平。我们通过基于密度泛函理论进行模拟来解决这个问题。我们提出IO和ITO衍生自BCC和Rombohedral IO多晶型物(100%,66%,33%和0%羟基化覆盖物)的羟基化表面。通过将所计算的数量(如状态部分密度,工作功能和表面偶极强度相关联,在这些模型系统中的结构功能关系的清晰图像出现。根据从实验中得出的结论,我们发现100%羟基表面和散装模型的状态的密度通过Sn掺杂不妨碍,唯一的差异是费米水平的位置。部分羟基化表面,而是显示出丰富的行为阵列,包括在间隙和有趣形态的间隙中的表面状态的外观,例如化学分子氧。我们还发现羟基化水平以系统的方式影响表面偶极子,即羟基化水平越高,表面偶极子越高(筛选/减少功函数)。此外,具有内原子空缺的模型显示出由于表面畸变而具有羟基覆盖的表面偶极物的相对较小的降低。

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