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III-VI semiconductors and oxides: Electronic structure, surface morphology, and transition metal doping of gallium selenide, indium selenide, and gallium oxide.

机译:III-VI半导体和氧化物:硒化镓,硒化铟和氧化镓的电子结构,表面形态和过渡金属掺杂。

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摘要

The effects of vacancies on the properties of certain III2VI 3 semiconductor compounds are studied with the goal of learning new, interesting physics while laying the groundwork for using these materials in next generation electronic devices. These III-VI materials exhibit intrinsic nanoscale voids or vacancies that order in different ways and impact the electronic structure, dopant incorporation and defect formation.;Ga2Se3 and gamma-In2Se3 are tetrahedrally bonded III-VI semiconductors with 1/3 of the cation sites vacant. Lattice matching allows excellent quality growth of Ga2Se 3 on silicon by molecular beam epitaxy. Comparison of our experimental map of the electronic band structure with theory shows proper theoretical treatment of the vacancies is essential to generate the band structure. We use scanning tunneling microscopy and X-ray absorption to study the Mn-doping of Ga2Se3, an intriguing candidate dilute magnetic semiconductor (DMS) system. Thin uniformly doped films of Mn-doped Ga2Se 3 were grown at low concentrations, but thicker or more concentrated films exhibit islands of MnSe. This may limit the applicability of Mn-doped Ga2Se3 as a DMS.;gamma-In2Se3 has a large lattice mismatch (∼7%) with silicon, which suggests that thick laminar films of In2Se 3 on silicon should not be possible. However, we find that laminar films can be grown up to at least 6 bilayer thickness, and show that this is due to an unusual Se-first interface with the silicon substrate.;beta-Ga2O3 is an optically transparent, III-VI semiconductor that generally exhibits n-type conductivity. We study the electronic structure, magnetic structure, surface termination, and surface morphology of pure, Mn- and Cr-doped beta-Ga2O3 single crystals. Cr3+ and mixed valence Mn2+/3+ occupy the octahedral sites in the structure. Mn incorporation degrades the crystal quality, while Cr does not. We use density functional theory to compute the activation energy of au oxygen vacancy defect, and find, contrary to the commonly held model, that it is too large for oxygen vacancies to contribute substantially to the conductivity in the n-type material. Using hard x-ray photoemission, we show that the bands are bent upward at the surface of air-cleaved beta-Ga 2O3 crystals, lowering the local activation energy.
机译:研究空位对某些III2VI 3半导体化合物的性能的影响,目的是学习新的有趣的物理方法,同时为在下一代电子设备中使用这些材料奠定基础。这些III-VI材料表现出固有的纳米级空隙或空位,它们以不同的方式排列并影响电子结构,掺杂剂掺入和缺陷形成。; Ga2Se3和γ-In2Se3是四面键合的III-VI半导体,具有1/3的阳离子位点是空的。晶格匹配可以通过分子束外延在硅上实现Ga2Se 3的优异质量生长。我们的电子能带结构实验图与理论的比较表明,对空位进行正确的理论处理对于产生能带结构至关重要。我们使用扫描隧道显微镜和X射线吸收来研究Ga2Se3的锰掺杂,Ga2Se3是一个引人入胜的候选稀磁半导体(DMS)系统。在低浓度下生长均匀掺杂的Mn的Ga2Se 3薄膜,但较厚或更浓的薄膜则显示出MnSe岛。这可能会限制Mn掺杂的Ga2Se3作为DMS的适用性;γ-In2Se3与硅的晶格失配较大(约7%),这表明In2Se 3在硅上的厚层状膜应该是不可能的。然而,我们发现层状膜可以生长到至少6层双层厚度,并表明这是由于与硅衬底的不寻常的Se-first界面所致。;β-Ga2O3是一种光学透明的III-VI半导体,通常表现出n型导电性。我们研究了纯的,Mn和Cr掺杂的β-Ga2O3单晶的电子结构,磁性结构,表面终止和表面形态。 Cr3 +和混合价Mn2 + / 3 +占据结构中的八面体位。锰的掺入会降低晶体质量,而铬不会。我们使用密度泛函理论来计算金氧空位缺陷的活化能,并且发现与通常持有的模型相反,氧空位太大而无法实质性地促进n型材料的电导率。使用硬X射线光发射,我们显示带在空气裂解的β-Ga2O3晶体的表面向上弯曲,从而降低了局部活化能。

著录项

  • 作者

    Lovejoy, Tracy Clark.;

  • 作者单位

    University of Washington.;

  • 授予单位 University of Washington.;
  • 学科 Condensed matter physics.
  • 学位 Ph.D.
  • 年度 2010
  • 页码 173 p.
  • 总页数 173
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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