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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Tuning the Electronic and Magnetic Properties of In-Planar Graphene/Boron Nitride Heterostructure by Doping 3d Transition Metal Atom
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Tuning the Electronic and Magnetic Properties of In-Planar Graphene/Boron Nitride Heterostructure by Doping 3d Transition Metal Atom

机译:通过掺杂3D过渡金属原子调节平面石墨烯/氮化物异质结构的电子和磁性性能

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摘要

The grain boundary (GB) composed of topological defects is likely to form where a merge occurred between two separate grains during the chemical vapor deposition fabrication process of in-planar two-dimensional heterostructural nanomaterials. Here, a systematic investigation regarding the geometrical stability, electronic, and magnetic properties of 3d transition metal (TM)-decorated in-planar graphene/hexagonal boron nitride bicrystalline heterostructure (GBN) was performed. The GGA + U approach is employed as the computation method. We selected a periodical grain boundary consisting of pentagon-heptagon or pentagon-octagon topological defects as the hybrid interface between graphene and h-BN domains, and we considered nine atoms, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, and Cu, for the TM addition. The GB was found to be the trapped region for all TM impurities during the adsorption process. The binding strength and charge transfer of adsorbed atoms were remarkably enhanced by the GB local topological defects. The adsorption of all nine TM atoms introduces a transformation from nonmagnetic states of pristine GBN to varying magnetization of TM-GBN. Spin-splitting band structures are found in all TM adsorption systems. Multiple electronic states can be achieved, including spin-polarized half-metallic states, half-semiconductor states, and metallic states. Both the charge injection from TM to GBN substrate and electron rearrangement between s, p, and d orbitals of impurity can work on the rich electronic and magnetic properties. Our findings indicate that it is feasible to obtain peculiar electronic and magnetic properties by surface TM addition, which can increase the utilization of in-planar graphene/h-BN heterostructure in spin-electronic materials and nanomagnet areas.
机译:由拓扑缺陷组成的晶界(GB)可能形成在平面二维异质结构纳米材料的化学气相沉积制造过程中的两个单独的晶粒之间发生的影响。这里,进行关于3D过渡金属(TM)的几何稳定性,电子和磁性的系统研究 - 平面石墨烯/六边形氮化硼双晶异质结构(GBN)。 GGA + U方法被用作计算方法。我们选择了由五角体 - 庚膜或五角形 - 八角形拓扑缺陷组成的期刊晶界,作为石墨烯和H-BN结构域之间的杂交界面,我们认为九颗粒,Sc,Ti,V,Cr,Mn,Fe,Co,Ni和Cu,用于TM添加。发现GB在吸附过程中是所有TM杂质的被捕获区域。通过GB局部拓扑缺陷显着提高吸附原子的结合强度和电荷转移。所有九个TM原子的吸附引入了从原始GBN的非磁性态变化到TM-GBN的变化磁化的转化。在所有TM吸附系统中发现了旋转分裂带结构。可以实现多种电子状态,包括旋转极化半导体状态,半导体状态和金属状态。从TM到GBN衬底的电荷注入和S,P和D杂质之间的电子重排可以对富电子和磁性有效。我们的研究结果表明,通过表面TM加法获得特殊的电子和磁性性是可行的,这可以增加旋转电子材料和纳米磁体区域中平面石墨烯/ H-BN异质结构的利用。

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