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Characterizing the geometric and electronic structure of defects in the '29' copper surface oxide

机译:表征“29”铜表面氧化物中的缺陷的几何和电子结构

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The geometric and electronic structural characterization of thin film metal oxides is of fundamental importance to many fields such as catalysis, photovoltaics, and electrochemistry. Surface defects are also well known to impact a material's performance in any such applications. Here, we focus on the "29" oxide Cu2O/Cu(111) surface and we observe two common structural defects which we characterize using scanning tunneling microscopy/spectroscopy and density functional theory. The defects are proposed to be O vacancies and Cu adatoms, which both show unique topographic and spectroscopic signatures. The spatially resolved electronic and charge state effects of the defects are investigated, and implications for their reactivity are given. Published by AIP Publishing.
机译:薄膜金属氧化物的几何和电子结构表征对许多领域(如催化,光伏和电化学)的重要性是重要的。 表面缺陷也众所周知,可以影响材料在任何此类应用中的材料。 这里,我们专注于“29”氧化物Cu2O / Cu(111)表面,我们观察到我们使用扫描隧道显微镜/光谱和密度泛函理论表征的两个共同的结构缺陷。 缺陷被提出为O空位和Cu吸附物,其既显示出独特的地形和光谱签名。 对缺陷的空间分辨的电子和电荷状态效应进行了研究,并给出了对其反应性的影响。 通过AIP发布发布。

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