首页> 外文会议>Materials Research Society Symposium >Electrochemical Properties Of Copper Oxide Surfaces, Buried Interfaces, And Subsurface Zones And Their Use To Characterize These Entities
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Electrochemical Properties Of Copper Oxide Surfaces, Buried Interfaces, And Subsurface Zones And Their Use To Characterize These Entities

机译:氧化铜表面,埋地界面和地下区域的电化学特性及其用于表征这些实体的用途

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Electrochemistry of oxides is an expanding area of oxide characterization. Although, interfacial characterization techniques including surface science methods have contributed substantially to our current understanding of the processes involved in the oxidation of metals and alloys, the characterization of subsurface zones and buried interfaces still remain a major challenge. Copper reactions with oxygen have been studied by high vacuum based techniques of AES, ELS, ISS, XPS, SIMS, LEED, STM, SEXAFS, HEIS and PFDMS and with optical methods, like UV-Vis-NIR, diffuse reflectance spectroscopy, FTIR and photoluminescence spectroscopes. However it has become evident that the processes that produce thermally and plasma grown oxide films on metals and alloys are electrochemical in nature and can be modeled by electrochemical concepts. Therefore, it is important that the oxide overlayers, thin films and thick films be characterized by electrochemical means-with electrochemical methods, such as linear potential sweep voltammetry, cyclic voltammetry, galvanostatic reduction and coulometry which allow the identification of copper (Ⅰ), copper (Ⅱ) and copper (Ⅲ) oxides. Interest in copper as a technologically important material needs to be met with greater understanding of the fundamental nature of copper oxide structures. In this study, the authors demonstrate the use of Linear Sweep Voltammetry (LSV) to study buried structures in the thermally grown oxide layers on copper. In particular, LSV can be used to detect reactions at buried interfaces. It also recognizes Cu_3O_2 and the decomposition of copper oxides at the metal-oxide interface. The two key parameters that drive oxide growth and decomposition are demonstrated to be oxygen activity and the free energies of formation of the oxides. The complex nature of the oxidation of copper, as well as other metals and alloys, will be described qualitatively using the Modified Cabrera-Mott (C-M) Model. Surface studies of oxidation of metals and alloys need to be supported and complemented by other techniques such as electrochemical methods.
机译:氧化物电化学是氧化物表征的扩张面积。尽管包括表面科学方法的界面特征技术基本上贡献了我们目前对金属和合金氧化过程中所涉及的过程的理解,但地下区的表征仍然是一个主要挑战。已经通过高真空的AES,ELS,ISS,XPS,SIMS,LEED,STM,SEXAF,HEIS和PFDMS以及光学方法研究了含氧的铜反应,以及紫外线Vis-NIR,弥漫反射光谱,FTIR和光致发光光谱法。然而,已经明显显而易见的是,在金属和合金上产生热和等离子体生长氧化物薄膜的过程是电化学的,并且可以通过电化学概念进行建模。因此,重要的是,氧化膜覆盖物,薄膜和厚膜的特征在于电化学方法 - 具有电化学方法,例如线性电位扫描伏安法,循环伏安法,镀锌和库仑,允许鉴定铜(Ⅰ),铜(Ⅱ)和铜(Ⅲ)氧化物。需要满足对铜的兴趣作为一种技术重要的材料,更加了解氧化铜结构的基本性质。在这项研究中,作者证明了使用线性扫描伏安法(LSV)来研究在铜上的热生长氧化物层中的掩埋结构。特别地,LSV可用于检测埋地界面的反应。它还识别Cu_3O_2和金属氧化物界面处的铜氧化物的分解。驱动氧化物生长和分解的两个关键参数被证明是氧活性和氧化物形成的自由能。使用改性的CabRERA-MOTT(C-M)模型,将描述铜的氧化和其他金属和合金的复杂性。需要支持和互补金属和合金氧化的表面研究,并通过电化学方法等其他技术互补。

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