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The dynamics of copper intercalated molybdenum ditelluride

机译:铜插入钼Ditelluide的动态

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Layered transition metal dichalcogenides are emerging as key materials in nanoelectronics and energy applications. Predictive models to understand their growth, thermomechanical properties, and interaction with metals are needed in order to accelerate their incorporation into commercial products. Interatomic potentials enable large-scale atomistic simulations connecting first principle methods and devices. We present a ReaxFF reactive force field to describe molybdenum ditelluride and its interactions with copper. We optimized the force field parameters to describe the energetics, atomic charges, and mechanical properties of (i) layered MoTe2, Mo, and Cu in various phases, (ii) the intercalation of Cu atoms and small clusters within the van derWaals gap of MoTe2, and (iii) bond dissociation curves. The training set consists of an extensive set of first principles calculations computed using density functional theory (DFT). We validate the force field via the prediction of the adhesion of a single layer MoTe2 on a Cu(111) surface and find good agreement with DFT results not used in the training set. We characterized the mobility of the Cu ions intercalated into MoTe2 under the presence of an external electric field via finite temperature molecular dynamics simulations. The results show a significant increase in drift velocity for electric fields of approximately 0.4 V/angstrom and that mobility increases with Cu ion concentration. Published by AIP Publishing.
机译:层状过渡金属二硫代甲基化物被纳入纳米电子和能量应用中的关键材料。需要了解他们的生长,热机械性能和与金属的相互作用的预测模型,以加速其纳入商业产品。互构势能够实现连接第一原理方法和设备的大规模原子模拟。我们提出了一种Reaxff反应力领域,以描述钼Ditellidide及其与铜的相互作用。我们优化了在各个相中(I)层状Mote2,Mo和Cu的能量,原子电荷和机械性能,(ii)在Mote2的范德文间隙内的嵌入Cu原子和小集群的插入中的能量和(iii)债券解离曲线。培训集由使用密度泛函理论(DFT)计算的广泛的第一原理计算。我们通过预测单层Mote2对Cu(111)表面的粘附来验证力场,并与未在训练集中使用的DFT结果找到良好的一致性。我们在通过有限温度分子动力学模拟的情况下,在外部电场的存在下,表征Cu离子嵌入到Mote2中的迁移率。结果显示出大约0.4V / angstrom的电场漂移速度的显着增加,并且迁移率随Cu离子浓度而增加。通过AIP发布发布。

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