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The effects of electric field on electronic and thermal properties of bilayer boron phosphide: Beyond nearest neighbor approximation

机译:电场对双层硼磷的电子和热性能的影响:超越最近邻近似

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摘要

The behaviors electronic structure and density of states (DOS) of biased AB bilayer boron phosphide (BP) with two configuration types (B P and B B) investigated by the fifth nearest neighbor tight binding model. The bias voltage and temperature dependence of electronic contribution of the heat capacity, electrical and thermal conductivity, paramagnetic susceptibility and Lorenz number have been investigated using linear response theory. The bias voltage increases the energy band gap in B P configuration while in the B B configuration, the band gap decreases to zero at critical bias voltage and then increases again as the bias increases beyond the critical voltage. For B B configuration type, the thermal properties increases with temperature and the thermal properties is larger for stronger bias voltage in U <= 1.0 eV and decreases by further bias increasing in the voltage range U > 1.0 eV. The thermal properties of B P configuration increases linearly with temperature and unlike to B B configuration type, which applying the bias voltage leads to decreasing its thermal properties. The thermal properties of B B configuration type showed more sensitivity to bias and temperature than B P configuration type and their differences increases by increasing the temperature up to 1000 K.
机译:具有由第五最近邻紧密绑定模型研究的两种配置类型(B P和B B)的偏置AB双层磷化硼(BP)的行为电子结构和密度(DOS)(BP)。的热容量的电子的贡献,电和热传导性,顺磁磁化率和洛伦茨数目的偏置电压和温度的依赖性已经使用线性响应理论研究。偏置电压在B P配置的同时增加了能量带隙,而在B B配置中,带隙在临界偏置电压下降到零,然后随着偏置的增加而增加,随着偏置的增加,再次增加。对于B B配置类型,热性能随温度的增加,热性能较大,对于U <= 1.0eV中的较强偏置电压,并且通过进一步偏置在电压范围U> 1.0eV中的进一步偏置而降低。 B P构造的热性能随温度和与B B配置类型不同的是,施加偏置电压导致其热性能降低。 B B配置类型的热性能显示比B P配置类型比B P配置类型更多的敏感性,并且通过将温度提高到1000k,它们的差异增加。

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