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Interfacial interaction and enhanced image contrasts in higher mode and bimodal mode atomic force microscopy

机译:界面相互作用和增强图像在更高模式和双峰模式原子力显微镜中形成对比

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摘要

Higher mode and bimodal atomic force microscopy (AFM) are two recently developed imaging modes of dynamic AFM for improving resolution. In higher mode, the higher flexural mode of the cantilever instead of the traditional fundamental eigenmode is excited. In bimodal mode, two flexural modes of the cantilever are simultaneously excited for obtaining more information about the properties of the material. The first three flexural modes for higher mode and superposition of two excitation signals for bimodal mode are explored and compared by imaging a polymer blend of polystyrene (PS) and low density polyethylene (LDPE). The effects of different operating conditions of the two imaging modes are researched to improve image contrast and material discrimination. Dissipated power and virial are employed to explain the origin of contrast for the complex and highly nonlinear dynamical tip-sample interfacial system. Amplitude and phase contrasts of each single mode and bimodal mode are calculated by Ashman's D statistical equation. It is found that higher single modes with small free amplitudes show enhanced phase contrast. The bimodal of the first and the third modes gains a clear advantage over the bimodal of the first and second modes for phase and amplitude image contrasts. In addition, the best contrast of bimodal imaging occurs when it is a combination of a large free amplitude for the first mode and a small free amplitude for the third mode.
机译:更高的模式和双峰原子力显微镜(AFM)是最近开发的动态AFM的成像模式,用于提高分辨率。在更高模式中,悬臂的弯曲模式较高,而不是传统的基本尖端模型是兴奋的。在双峰模式中,同时激发悬臂的两个弯曲模式,以获得有关材料性质的更多信息。通过对聚苯乙烯(PS)和低密度聚乙烯(LDPE)的聚合物共混物成像,探索具有用于双模模式的较高模式和叠加两种激发信号的前三种弯曲模式。研究了两种成像模式的不同操作条件的影响,以改善图像对比度和材料辨别。采用耗散功率和病毒剂来解释复合物和高度非线性动态尖端样品界面系统的对比度的起源。通过Ashman的D统计方程计算每个单模和双峰模式的幅度和相位对比度。发现具有小自由幅度的较高的单种模式显示出增强的相位对比度。第一和第三模式的双极性在用于相位和幅度图像对比度的第一和第二模式的双峰上产生了明显的优势。另外,当它是第一模式的大自由幅度和第三模式的小自由幅度时,发生双峰成像的最佳对比。

著录项

  • 来源
    《RSC Advances 》 |2017年第87期| 共10页
  • 作者

    Shi Shuai; Guo Dan; Luo Jianbin;

  • 作者单位

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学 ;
  • 关键词

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