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Origin of surface potential in undoped zinc oxide films revealed by advanced scanning probe microscopy techniques

机译:未掺杂的氧化锌膜的表面电位起源通过先进的扫描探针显微镜技术揭示

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摘要

This paper presents recent studies combining piezoresponse force microscopy and Kelvin probe force microscopy to reveal the origin of bias-induced changes of surface potential in undoped zinc oxide (ZnO) films at the nanoscale. Surface potential under dc bias in ZnO films is studied using Kelvin probe force microscopy (KPFM). In addition, the piezoelectric properties of the ZnO are investigated by applying voltage using piezoresponse force microscopy (PFM), which is adopted to provide new physical insight into the important role of polarization charge in surface potential. PFM and KPFM results suggest that the origin of surface potential under an electric field in undoped ZnO film is determined by polarization charge, injection charge and surface charge. In addition, significant change in the Fermi level (work function) of undoped ZnO is found by positive (negative) biasing. The qualitative and quantitative study of surface potential and charge trapping properties can be useful for designing advanced nanoscale nonvolatile memory devices.
机译:本文提出了最近的研究组合压电响应力显微镜和开尔文探针力学显微镜,揭示了纳米载体在纳米级上未掺杂的氧化锌(ZnO)膜中表面电位变化的起源。使用Kelvin探针力显微镜(KPFM)研究ZnO膜中DC偏压下的表面电位。另外,通过使用压电响应力显微镜(PFM)施加电压来研究ZnO的压电性能,这是采用的,这被采用这将新的物理洞察到表面电位中的极化电荷的重要作用。 PFM和KPFM结果表明,通过偏振电荷,注射电荷和表面电荷确定了未掺杂的ZnO膜中的电场下表面电位的起源。此外,通过正(负)偏置,发现未掺杂的ZnO的费米水平(工作函数)的显着变化。表面电位和电荷捕获特性的定性和定量研究对于设计先进的纳米级非易失性存储器件是有用的。

著录项

  • 来源
    《RSC Advances》 |2017年第67期|共5页
  • 作者

    Su Ting;

  • 作者单位

    Fudan Univ Dept Phys State Key Lab Surface Phys Shanghai 200433 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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