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Structures and characteristics of atomically thin ZrO2 from monolayer to bilayer and two-dimensional ZrO2-MoS2 heterojunction

机译:从单层到双层和二维ZrO2-MOS2异质结的原子薄ZrO2的结构和特征

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The understanding of the structural stability and properties of dielectric materials at the ultrathin level is becoming increasingly important as the size of microelectronic devices decreases. The structures and properties of ultrathin ZrO2 (monolayer and bilayer) have been investigated by ab initio calculations. The calculation of enthalpies of formation and phonon dispersion demonstrates the stability of both monolayer and bilayer ZrO2 adopting a honeycomb-like structure similar to 1T-MoS2. Moreover, the 1T-ZrO2 monolayer or bilayer may be fabricated by the cleavage from the (111) facet of non-layered cubic ZrO2. Moreover, the contraction of in-plane lattice constants in monolayer and bilayer ZrO2 as compared to the corresponding slab in cubic ZrO2 is consistent with the reported experimental observation. The electronic band gaps calculated from the GW method show that both the monolayer and bilayer ZrO2 have large band gaps, reaching 7.51 and 6.82 eV, respectively, which are larger than those of all the bulk phases of ZrO2. The static dielectric constants of both monolayer ZrO2 (epsilon = 33.34, epsilon (perpendicular to) = 5.58) and bilayer ZrO2 (epsilon = 33.86, epsilon (perpendicular to) = 8.93) are larger than those of monolayer h-BN (epsilon = 6.82, epsilon (perpendicular to) = 3.29) and a strong correlation between the out-of-plane dielectric constant and the layer thickness in ultrathin ZrO2 can be observed. Hence, 1T-ZrO2 is a promising candidate in 2D FETs and heterojunctions due to the high dielectric constant, good thermodynamic stability, and large band gap for applications. The interfacial properties and band edge offset of the ZrO2-MoS2 heterojunction are investigated herein, and we show that the electronic states near the VBM and CBM are dominated by the contributions from monolayer MoS2, and the interface with monolayer ZrO2 will significantly decrease the band gap of the monolayer MoS2.
机译:由于微电子器件的尺寸减小,对超薄水平的结构稳定性和介电材料的结构稳定性和性质变得越来越重要。通过AB Initio计算研究了超薄ZrO2(单层和双层)的结构和性质。形成形成和声子分散的焓证明了单层和双层ZrO2的稳定性,其采用类似于1T-MOS2的蜂窝状结构。此外,1T-ZrO2单层或双层可以通过来自非层叠立方ZrO2的(111)刻面的切割来制造。此外,与立方ZrO2中的相应板相比,单层和双层ZrO2中的平面内晶格常数的收缩与报告的实验观察一致。从GW方法计算的电子带间隙表明单层和双层ZrO2分别具有大的带间隙,分别达到7.51和6.82eV,其大于ZrO2的所有本体相的阵列。单层ZrO2(Epsilon = 33.34,ε(垂直于)= 5.58)和双层ZrO2(epsilon = 33.86,ε(垂直于)ε13.86)的静电介电常数大于单层H-Bn(Epsilon = 6.82 ,ε(垂直于)= 3.29)和平面外介电常数与超薄Zro2中的层厚度之间的强相关性。因此,1T-的ZrO2为2D FET和异质结有希望的候选由于高介电常数,良好的热力学稳定性,而对于应用大的带隙。本文研究了ZrO2-MOS2异质结的界面性质和带边缘偏移,并且我们表明VBM和CBM附近的电子状态是由单层MOS2的贡献主导,并且与单层ZrO2的界面将显着降低带隙的带隙单层MOS2。

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    《RSC Advances》 |2019年第57期|共11页
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