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Annealing effect on UV-illuminated recovery in gas response of graphene-based NO2 sensors

机译:退火对石墨烯的NO2传感器气体响应中紫外线照射回收的影响

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摘要

The response and recovery of a graphene-based sensor for nitrogen dioxide (NO2) sensing is improved by a combination of two treatments including rapid thermal annealing (RTA) of graphene and UV illumination during the pump down period. A two-dimensional monolayer graphene grown by chemical vapor deposition was transferred to an arc-shape electrode and subsequently heated at temperatures from 200 to 400 degrees C for 1 min in N-2 atmosphere by RTA to eliminate the chemical residues on the graphene generated in the transfer process. The effect of RTA and poly(methyl methacrylate) (PMMA) residues was investigated using Raman spectroscopy. The shift of the G and 2D bands could be due to graphene suffering from compressive strain and hole doping from the substrate enhanced by the RTA treatment. The hole doping effect was also observed from Hall measurements. Atomic force microscopy images confirm the PMMA residues and surface roughness reduction by the RTA treatment. Annealing at 300 degrees C enhances the NO2 sensing response at 1 ppm by 4 times compared to the pristine graphene without RTA. Full recovery of the sensor to the initial baseline could be achieved by the adjustment of UV illumination time.
机译:通过包括在泵向下时段期间的石墨烯和UV照明的三种处理的组合,改善了基于石墨烯的氮气(NO2)感测的基于石墨烯的传感器的响应和恢复。通过化学气相沉积生长的二维单层石墨烯转移到弧形电极中,随后通过RTA在N-2大气中在200至400℃的温度下加热1分钟,以消除产生的石墨烯上的化学残留物转移过程。使用拉曼光谱研究RTA和聚(甲基丙烯酸甲酯)(PMMA)残基的影响。 G和2D带的偏移可能是由于RTA处理增强的压缩应变和孔掺杂的石墨烯。霍尔测量也观察到孔掺杂效果。原子力显微镜图像通过RTA处理确认PMMA残留物和表面粗糙度降低。与原始石墨烯相比,在300摄氏度下,在3℃的No2感测响应的情况下,与原始石墨烯没有RTA相比。通过调整UV照明时间,可以通过调整紫外线照明时间来实现传感器到初始基线的完全恢复。

著录项

  • 来源
    《RSC Advances》 |2019年第40期|共9页
  • 作者单位

    Chang Gung Univ Dept Elect Engn Taoyuan 333 Taiwan;

    Chang Gung Univ Dept Elect Engn Taoyuan 333 Taiwan;

    Chang Gung Univ Dept Elect Engn Taoyuan 333 Taiwan;

    NASA Ctr Nanotechnol Ames Res Ctr Moffett Field CA 94035 USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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