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首页> 外文期刊>RSC Advances >Molecular orientation and stability of poly(3-hexylthiophene) nanogratings affected by the fabricated solvent vapor
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Molecular orientation and stability of poly(3-hexylthiophene) nanogratings affected by the fabricated solvent vapor

机译:由制造溶剂蒸气影响的聚(3-己基噻吩)纳米疱疹的分子取向和稳定性

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During the nanoimprinting lithography (NIL) process, the role of solvent vapor in fabricating the pattern structure and inducing the molecular alignment of nanoimprinted polymer film has been attracting significant attention. We demonstrate here that the molecular orientation and thermal stability of poly(3-hexylthiophene) (P3HT) nanograting film can be affected obviously by the fabricated solvent vapor. A solvent-vapor nanoimprinting lithography (SV-NIL) technique based on a polydimethylsiloxane (PDMS) template is employed to fabricate a P3HT nanograting structure film successfully and solvent vapor is offered by chlorobenzene, chloroform and carbon disulphide, respectively. The molecular orientation of the polymer film is carefully characterized by grazing incidence wide angle X-ray diffraction (GIWAXD) measurements to investigate the effect of various solvent vapors on the molecular orientation of the P3HT nanograting film. For the P3HT nanograting film fabricated by chloroform and chlorobenzene solvent, the edge-on molecular orientation of the typical form II crystallographic structure is induced. However, this indicates that there are both the face-on molecular orientations of the form II and form I crystallographic conformation present for the P3HT nanograting film fabricated by carbon disulphide solvent. Therefore, the fabricated solvent vapor plays a significant role in determining the formation of the molecular orientation of the polymer nanostructure. Then, the role of thermal annealing in the stability of the molecular orientation was investigated for the P3HT nanograting film after a fixed temperature. As for the annealed nanograting film fabricated by chlorobenzene and chloroform solvent vapor, a single edge-on molecular orientation mode of the form I crystallographic structure has been obtained. However, for the annealed nanograting film fabricated by the carbon disulphide solvent, the edge-on and face-on molecular orientations of the form I crystallographic structure are still retained. This indicates that the stability of the form II crystallographic conformation is mainly dependent on the thermal annealing process. Therefore, after the annealing process, the final determining of the molecular alignment and crystallographic conformation depends significantly on the orientation type of the nanograting film before the annealing history, and it can be further inferred that the molecular orientation of the annealed polymer film is still affected by the fabricated solvent vapor significantly. Thus this will provide new understanding and guidance for the research of the topographical structure and molecular alignment of conjugated polymers.
机译:在纳米压印光刻(NIL)过程中,溶剂蒸气在制造图案结构和纳米压印的诱导聚合物薄膜的分子排列的作用已引起注意显著。我们在这里表明,分子取向和聚热稳定性(3-己基噻吩)(P3HT)nanograting膜可以明显影响由所制造的溶剂蒸气。 (PDMS)模板采用基于聚二甲基硅氧烷的溶剂蒸气纳米压印光刻(SV-NIL)技术成功地制作P3HT nanograting结构膜和溶剂蒸汽通过分别氯苯,氯仿和二硫化碳,提供。聚合物膜的分子取向是经过精心特征在于掠入射广角X射线衍射(GIWAXD)测量,以研究各种溶剂蒸汽对P3HT nanograting膜的分子取向的效果。对于P3HT nanograting膜制造用氯仿和氯苯溶剂中,边缘上的典型形式II结晶结构的分子取向被诱导。然而,这表明有两个面朝上的形式II的分子取向,并形成结晶我构象本作的P3HT nanograting膜制造由二硫化碳溶剂。因此,所制造的溶剂蒸汽在决定聚合物纳米结构的分子取向的形成显著作用。然后,热退火的在分子取向的稳定性的作用的固定温度后,研究对P3HT nanograting膜。作为退火nanograting膜制造由氯苯和氯仿溶剂蒸气,我晶体结构已经得到的单一边缘上的形式的分子取向模式。然而,对于退火nanograting膜制作由二硫化碳溶剂,边缘上和面朝上的形式I结晶结构的分子取向仍保留。这表明晶形II的结晶构象的稳定性主要取决于热退火工艺。因此,退火过程之后,最终确定所述分子取向和结晶构象显著取决于退火历史前的取向类型的nanograting膜的,并且它可以进一步推断出,退火聚合物膜的分子取向仍受到由所制作的溶剂蒸气显著。因此,这将提供形貌结构的研究和共轭聚合物的分子取向新的认识和指导。

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    《RSC Advances 》 |2019年第49期| 共9页
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  • 正文语种 eng
  • 中图分类 化学 ;
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