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Metal oxide heterojunctions using a printable nickel oxide ink

机译:使用可印刷镍墨水的金属氧化物异质结

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摘要

Wide band gap metal oxides are ideally suited for inorganic optoelectronic devices. While zinc oxide is a commonly used n-type material, there is still a lot of ongoing work for finding suitable p-type oxides. In this work, we describe a two-step route to formulate a stable and conducting p-type nickel oxide (NiO) nanofluid. NiO nanoparticles were synthesised using a bottom-up wet chemical approach and dispersed in ethylene glycol to form a nanofluid. The viscosity and surface tension of the nanofluid were optimised for printing. The printing was done using an extrusion-based direct writer. The NiO nanofluid was printed onto an aluminum-doped zinc oxide layer and annealed at different temperatures. Electrical characterisation of the junction was used to extract the junction barrier for carriers across the interface. The resulting heterojunction was found to exhibit rectifying behaviour, with the highest rectification ratio occurring at an annealing temperature of 250 degrees C. This annealing temperature also resulted in the lowest junction barrier height, and was in excellent agreement with theoretically predicted values. The development of a printed p-type ink will help in the realisation of oxide-based printed electronic devices.
机译:宽带间隙金属氧化物非常适用于无机光电器件。虽然氧化锌是常用的n型材料,但仍有很多用于寻找合适的p型氧化物的持续工作。在这项工作中,我们描述了一种两步的途径来配制稳定和导电的p型氧化镍(NiO)纳米流体。使用自下而上的湿化学方法合成NiO纳米粒子,并分散在乙二醇中以形成纳米流体。纳米流体的粘度和表面张力被优化用于印刷。使用挤出基直接作者进行印刷。将NiO纳米流体印刷到铝掺杂的氧化锌层上,并在不同的温度下退火。结合结的电气表征用于在界面上提取用于载体的结屏障。发现所得的异质结表现出整流行为,在250℃的退火温度下发生的最高整流比。该退火温度也导致结势高度最低,并且与理论上预测值非常吻合。印刷P型墨水的开发将有助于实现氧化物的印刷电子设备。

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  • 来源
    《RSC Advances》 |2020年第7期|共9页
  • 作者单位

    Indian Inst Technol Madras Elect Mat &

    Thin Films Lab Dept Met &

    Mat Engn Chennai 600036 Tamil Nadu India;

    Indian Inst Technol Madras Elect Mat &

    Thin Films Lab Dept Met &

    Mat Engn Chennai 600036 Tamil Nadu India;

    Indian Inst Technol Madras Elect Mat &

    Thin Films Lab Dept Met &

    Mat Engn Chennai 600036 Tamil Nadu India;

    Indian Inst Technol Madras Elect Mat &

    Thin Films Lab Dept Met &

    Mat Engn Chennai 600036 Tamil Nadu India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
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