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Scanning probe microscopy induced surface modifications of the topological insulator Bi2Te3 in different environments

机译:扫描探针显微镜感应不同环境中拓扑绝缘体BI2Te3的表面修改

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摘要

We investigated the topological insulator (TI) Bi2Te3 in four different environments (ambient, ultra-high vacuum (UHV), nitrogen gas and organic solvent environment) using scanning probe microscopy (SPM) techniques. Upon prolonged exposure to ambient conditions and organic solvent environments the cleaved surface of the pristine Bi2Te3 is observed to be strongly modified during SPM measurements, while imaging of freshly cleaved Bi2Te3 in UHV and nitrogen gas shows considerably less changes of the Bi2Te3 surface. We conclude that the reduced surface stability upon exposure to ambient conditions is triggered by adsorption of molecular species from ambient, including H2O, CO2, etc which is verified by Auger electron spectroscopy. Our findings of the drastic impact of exposure to ambient on the Bi2Te3 surface are crucial for further in-depth studies of the intrinsic properties of the TI Bi2Te3 and for potential applications that include room temperature TI based devices operated under ambient conditions.
机译:我们使用扫描探针显微镜(SPM)技术研究了四种不同环境中的拓扑绝缘体(TI)Bi2te3(环境,超高真空(UHV),氮气和有机溶剂环境)。在长时间暴露于环境条件和有机溶剂环境后,观察到在SPM测量期间被强烈地修改原始BI2Te3的切割表面,同时在UHV和氮气中的新切割的Bi2Te3的成像显示了Bi2Te3表面的变化得多。我们得出结论,通过从环境温度吸附分子种质,包括通过螺旋钻电子光谱验证的H2O,CO 2等,引发降低的表面稳定性。我们的曝光的剧烈冲击至环境所述Bi2Te3表面上发现是至关重要的TI的Bi2Te3的固有性质的进一步的深入研究和包括在环境条件下操作的室温TI基器件的潜在应用。

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