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Nanoscale linear permittivity imaging based on scanning nonlinear dielectric microscopy

机译:基于扫描非线性介电显微镜的纳米级线性介电常数

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摘要

A nanoscale linear permittivity imaging method based on scanning nonlinear dielectric microscopy (SNDM) was developed. The partial derivative C/partial derivative z- mode SNDM (partial derivative C/partial derivative z- SNDM) technique described herein employs probe-height modulation to suppress disturbances originating from stray capacitance and to improve measurement stability. This method allows local permittivity distributions to be examined with extremely low noise levels (approximately 0.01 aF) by virtue of the highly sensitive probe. A cross-section of a multilayer oxide film was visualized using. (partial derivative C/partial derivative z-) SNDM as a demonstration, and numerical simulations of the response signals were conducted to gain additional insights. The experimental signal intensities were found to be in a good agreement with the theoretical values, with the exception of the background components, demonstrating that absolute sample permittivity values could be determined. The signal profiles near the boundaries between different dielectrics were calculated using various vibration amplitudes and the boundary transition widths were obtained. The beneficial aspects of higher-harmonic response imaging are discussed herein, taking into account assessments of spatial resolution and quantitation.
机译:开发了一种基于扫描非线性介电显微镜(SNDM)的纳米级线性介电常数成像方法。本文所述的部分衍生C /部分衍生Z-模式SNDM(部分导数C /部分导数Z-SNDM)采用探测高度调制来抑制源自杂散电容的干扰并提高测量稳定性。该方法允许通过高度敏感的探针将局部允许分布用极低的噪声水平(约0.01AF)检查。使用多层氧化膜的横截面。 (部分导数C /部分导数Z-)SNDM作为演示,进行了响应信号的数值模拟,以获得额外的见解。发现实验信号强度与理论值良好的一致性,除了背景部件,可以确定可以确定绝对样本介电常数值。使用各种振动幅度计算不同电介质之间的边界附近的信号曲线,并获得边界过渡宽度。本文讨论了高谐波响应成像的有益方面,考虑到空间分辨率和定量的评估。

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