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Improved figures of merit of nano-Schottky diode by embedding and characterizing individual gold nanoparticles on n-Si substrates

机译:通过在N-Si衬底上嵌入和表征单个金纳米粒子来改进纳米肖特基二极管的优点图

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Improving Schottky diode characteristics in semiconducting devices is essential for better functionality in electronic and optoelectronic devices at nanoscale. In this paper, we investigate the electric transport characteristics of a gold (Au)-tip/n-Si-based nano-Schottky diode by using a conductive-mode atomic force microscope (CAFM). First, 10 nm average diameter Au nanoparticles (NPs) are monodispersed on the highly cleaned n-type Si substrate using an optimized spin-coating technique. The controlled and well dispersed NPs are confirmed by using the AC imaging mode of the AFM. The electrical characteristics are established by using an Au-coated AFM tip, by either soft engaging at the surface of the n-Si substrate or at the top of an individual Au NP. Landing of the AFM tip on the NP or n-Si substrate is validated by the force curves of the AFM. From the localized CAFM electrical characteristics, we observed the improvement in the figures of merit (FOM) that characterize the rectification performance including the (1-V) asymmetry (f(ASYM)), and the turn-on voltage due to placing the Au NP between the AFM tip and n-Si substrate. These improved FOM of the nanoscale diodes are explained based on the increase in the tunneling current at the nanoscale Au-NP/n-Si interface. Moreover, the nanoscale control of interface structure is extremely important to improve the characteristics of nano-Schottky diodes.
机译:改善半导体装置中的肖特基二极管特性对于纳米级电气和光电器件的更好功能是必不可少的。在本文中,我们通过使用导电模式原子力显微镜(CAFM)来研究金(AU)-TIP / N-Si基纳米 - 肖特基二极管的电传输特性。首先,使用优化的旋涂技术在高清清洁的N型Si衬底上单分离10nm平均直径Au纳米颗粒(NPS)。通过使用AFM的AC成像模式确认受控和良好的分散的NPS。通过使用Au涂覆的AFM尖端来建立电特性,通过在N-Si衬底的表面处或在单独的Au np的顶部处使用柔软的接合。通过AFM的力曲线验证NP或N-Si衬底上的AFM尖端的着陆。从局部的CAFM电气特性,我们观察了表征包括(1-V)不对称(F(图像))的整流性能的优点(FOM)的改善,并且由于放置AU而导致的导通电压AFM尖端和N-Si衬底之间的NP。基于纳米级AU-NP / N-Si接口的隧道电流的增加来解释纳米级二极管的这些改进的FOM。此外,纳米级控制的界面结构对于改善纳米肖特基二极管的特性非常重要。

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