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Tunable Schottky barrier in InTe/graphene van der Waals heterostructure

机译:Inte / Graphene van der Wa族异性结构的可调肖特基障碍

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摘要

The structures and electronic properties of InTe/graphene van der Waals heterostructures are systematically investigated using the first-principles calculations. The electronic properties of InTe monolayer and graphene are well preserved respectively and the bandgap energy of graphene is opened to 36.5 meV in the InTe/graphene heterostructure. An n-type Schottky contact is formed in InTe/graphene heterostructure at the equilibrium state. There is a transformation between n-type and p-type Schottky contact when the interlayer distance is smaller than 3.56 angstrom or the applied electric field is larger than -0.06 V angstrom(-1). In addition, the Schottky contact converts to Ohmic contact when the applied vertical electric field is larger than 0.11 V angstrom(-1) or smaller than -0.13 V angstrom(-1).
机译:使用第一原理计算系统地研究了内嵌/石墨烯VAN DER WAALS异质结构的结构和电子性质。 Inte单层和石墨烯的电子性质分别保持良好,并且石墨烯的带隙能量在内嵌/石墨烯异质结构中打开至36.5mEV。 在平衡状态下在嵌合/石墨烯异质结构中形成n型肖氏触点。 当层间距离小于3.56埃或施加的电场大于-0.06 v埃(-1)时,N型和P型肖特基接触之间存在变换。 此外,当施加的垂直电场大于0.11伏埃(-1)或小于-0.13V埃(-1)时,肖特基接触转换为欧姆接触。

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