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Tunable Schottky barrier in graphene/graphene-like germanium carbide van der Waals heterostructure

机译:石墨烯/类石墨烯碳化锗范德华异质结构中的可调肖特基势垒

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摘要

The structural and electronic properties of van der Waals (vdW) heterostructrue constructed by graphene and graphene-like germanium carbide were investigated by computations based on density functional theory with vdW correction. The results showed that the Dirac cone in graphene can be quite well-preserved in the vdW heterostructure. The graphene/graphene-like germanium carbide interface forms a p-type Schottky contact. The p-type Schottky barrier height decreases as the interlayer distance decreases and finally the contact transforms into a p-type Ohmic contact, suggesting that the Schottky barrier can be effectively tuned by changing the interlayer distance in the vdW heterostructure. In addition, it is also possible to modulate the Schottky barrier in the graphene/graphene-like germanium carbide vdW heterostructure by applying a perpendicular electric field. In particular, the positive electric field induces a p-type Ohmic contact, while the negative electric field results in the transition from a p-type to an n-type Schottky contact. Our results demonstrate that controlling the interlayer distance and applying a perpendicular electric field are two promising methods for tuning the electronic properties of the graphene/graphene-like germanium carbide vdW heterostructure, and they can yield dynamic switching among p-type Ohmic contact, p-type Schottky contact, and n-type Schottky contact in a single graphene-based nanoelectronics device.
机译:通过基于密度泛函理论和vdW校正的计算,研究了由石墨烯和类石墨烯碳化锗构成的范德华(vdW)异质结构的结构和电子性能。结果表明,石墨烯中的狄拉克锥在vdW异质结构中可以很好地保留。石墨烯/石墨烯状碳化锗界面形成p型肖特基接触。随着层间距离的减小,p型肖特基势垒高度减小,最终该接触转变为p型欧姆接触,这表明可以通过改变vdW异质结构中的层间距离来有效地调整肖特基势垒。另外,还可以通过施加垂直电场来调制石墨烯/石墨烯状碳化锗vdW异质结构中的肖特基势垒。特别地,正电场感应出p型欧姆接触,而负电场导致从p型肖特基接触转变为n型肖特基接触。我们的结果表明,控制层间距离和施加垂直电场是调节石墨烯/类石墨烯碳化锗vdW异质结构电子性能的两种有前途的方法,它们可以在p型欧姆接触,p-单个石墨烯基纳米电子器件中的n型肖特基接触和n型肖特基接触。

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