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首页> 外文期刊>Nanotechnology >Growth optimization and characterization of regular arrays of GaAs/AIGaAs core/shell nanowires for tandem solar cells on silicon
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Growth optimization and characterization of regular arrays of GaAs/AIGaAs core/shell nanowires for tandem solar cells on silicon

机译:GaAs / Aigaas核心/壳纳米线常规阵列的增长优化与表征硅片太阳能电池

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With a band gap value of 1.7 eV, Al0.2Ga0.8As is one of the ideal III-V alloys for the development of nanowire-based Tandem Solar Cells on silicon. Nevertheless, growing self-catalysed AlGaAs nanowires on silicon by solid-source molecular beam epitaxy is a very difficult task due to the oxidation of Al adatoms by the SiO2 layer present on the surface. Here we propose a nanowire structure including a p.i.n radial junction inside an Al0.2Ga0.8As shell grown on a p-GaAs core. The crystalline structure of such self-catalysed nanowires grown on an epi-ready Si(111) substrate (with a thin native SiO2 layer) was investigated by transmission electronic microscopy and photoluminescence. I(V) measurements performed on single nanowires have shown a diode-like behaviour corresponding to the radial p.i.n junction inside the Al0.2Ga0.8As shell. Moreover, a current generation under the electron beam was evidenced over the entire radial junction along the nanowires by means of electron beam induced current (EBIC) microscopy. The same structure was reproduced on patterned substrates with a SiO2 mask, producing an ordered hexagonal array. High and uniform yields from 83% to 87% of vertical nanowires were obtained on 0.9 x 0.9 cm(2) patterned areas. EBIC mapping performed on these nanowires confirmed the good electrical properties of the radial junction within the nanowires.
机译:对于1.7eV的带隙值,Al0.2Ga0.8as是用于在硅的纳米线的串联太阳能电池开发的理想III-V合金之一。然而,通过固体源分子束外延在硅上生长自我催化的藻类纳米线是由于在表面上存在的SiO 2层的Al Adatoms氧化而产生的非常困难的任务。在这里,我们提出了一种纳米线结构,包括在P-GaAs核心的Al0.2Ga0.8as壳体内的p.i.n径向连接。通过透射电子显微镜和光致发光来研究在ePI就绪Si(111)衬底(具有薄的天然SiO2层)上生长的这种自催化纳米线的结晶结构。在单纳米线上进行的I(V)测量已经示出了与Al0.2Ga0.8as壳内的径向P.i.n结相对应的二极管状行为。此外,通过电子束感应电流(EBIC)显微镜,在沿着纳米线上的整个径向连接中,在整个径向结上证明了电子束下的电流。在具有SiO 2掩模的图案化基板上再现相同的结构,产生有序的六边形阵列。在0.9×0.9cm(2)图案区域,获得高且均匀的产率为83%至87%的垂直纳米线。在这些纳米线上进行的EBIC映射确认了纳米线内的径向连接的良好电性能。

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