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首页> 外文期刊>Nano letters >Controllable Thickness Inhomogeneity and Berry Curvature Engineering of Anomalous Hall Effect in SrRuO3 Ultrathin Films
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Controllable Thickness Inhomogeneity and Berry Curvature Engineering of Anomalous Hall Effect in SrRuO3 Ultrathin Films

机译:SRRUO3超薄薄膜异常霍尔效应的可控厚度不均匀性和浆果曲率工程

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摘要

In quantum matters hosting electron-electron correlation and spin-orbit coupling, spatial inhomogeneities, arising from competing ground states, can be essential for understanding exotic topological properties. A prominent example is Hall anomalies observed in SrRuO3 films, which were interpreted in terms of either magnetic skyrmion-induced topological Hall effect or inhomogeneous anomalous Hall effect (AHE). To clarify this ambiguity, we systematically investigated the evolution of AHE with controllable inhomogeneities in SrRuO3 film thickness (t(SRO)). By exploiting the step-flow growth of SrRuO3 films, we induced a microscopically ordered stripe pattern with one-unit-cell differences in t(SRO). The associated spatial distribution of momentum-space Berry curvatures enables a two-channel AHE with hump-like Hall anomalies, which can be continuously engineered according to non-integer t(SRO). We further microscopically characterized the stripe-like ferromagnetic domains and two-step magnetic switching behavior in the inhomogeneous SrRuO3 film. These unique features can be utilized to identify the two-channel AHE model and understand its microscopic origin.
机译:在量子事项托管电子 - 电子关联和自旋轨道耦合,空间不均匀性,从竞争的基态产生的,对于了解异国情调的拓扑性质是必不可少的。一个突出的实例是SrRuO3膜,其被解释为任一磁skyrmion诱导拓扑霍尔效应或不均匀反常霍耳效应(AHE)方面观察到的霍尔异常。为了阐明这种模糊性,我们系统地研究AHE的演变与SrRuO3膜厚度可控的不均匀性(T(SRO))。通过利用SrRuO3膜的台阶流动生长,我们诱导的与吨(SRO)的单晶胞的差异微观有序条纹图案。动量空间贝里曲率的相关联的空间分布使得能够与驼峰状霍尔异常,其可以根据非整数t(SRO)被连续地工程化的双通道AHE。我们进一步用显微镜,其特征在于条状的不均匀SrRuO3薄膜铁磁结构域和两步骤的磁性切换行为。这些独特的特征可以被用于识别双通道AHE模型并理解其微观起源。

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