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首页> 外文期刊>Journal of Physics. Condensed Matter >Is surface crystallization in liquid eutectic AuSi surface-induced?
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Is surface crystallization in liquid eutectic AuSi surface-induced?

机译:液态共晶AuSi中的表面结晶是表面诱导的吗?

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Recent x-ray measurements have revealed surface crystallization in the liquid eutectic Au0.82Si0.18 alloy accompanied by a pronounced surface-induced layering with a thickness of seven to eight well-defined atomic layers. For the crystalline surface monolayer a stoichiometry of AuSi2 has been determined, implying a strong Si surface enrichment. In this study we have analysed the composition at the interface with vacuum of the solid and liquid eutectic alloy by means of x-ray photoelectron spectroscopy (XPS). Evaluation of the XPS spectra using a homogeneous interface model and an inhomogeneous interface model clearly indicates a strong interfacial enrichment of Si in agreement with the x-ray measurements. In an interfacial layer of 2 nm thickness the average Si concentration is nearly three times larger than that in the bulk. However, the XPS spectra give evidence for a low concentration (similar to 3 at.%) of oxide impurities at the interface-in all probability SiO2-which raises the question of whether surface crystallization in this alloy is surface-induced or driven by SiO2 nucleation centres.
机译:最近的X射线测量表明,在液态低共熔Au0.82Si0.18合金中存在表面结晶,并伴随着明显的表面感应层,其厚度为7至8个明确定义的原子层。对于晶体表面单层,已经确定了AuSi2的化学计量,这意味着强烈的Si表面富集。在这项研究中,我们通过X射线光电子能谱(XPS)分析了固态和液态共晶合金在真空下的界面组成。使用均质界面模型和非均质界面模型对XPS光谱的评估清楚地表明,与X射线测量结果一致,Si的界面富集性很强。在2 nm厚度的界面层中,平均Si浓度几乎是整体中Si浓度的三倍。但是,XPS光谱提供了界面处氧化物杂质浓度低(约3 at。%)的证据-在所有可能性下SiO2-都提出了这种合金中的表面结晶是表面诱导还是由SiO2驱动的问题成核中心。

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