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Polarization reduction in half-metallic Heusler alloys: the effect of point defects and interfaces with semiconductors

机译:半金属Heusler合金的极化减少:点缺陷和与半导体的界面的影响

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摘要

Half-metallic full-Heusler alloys represent a promising class of materials for spintronic applications. However, (i) intrinsic point defects in Heusler compounds can be detrimental with respect to their predicted 100% spin polarization at the Fermi level and (ii) when joined to mainstream semiconductors the presence of interface states-which destroys half-metallicity-can degrade their performance. Here, we present an overview of recent first-principles calculations performed to explore both these issues. In particular, we focus on ab initio FLAPW calculations performed for Co2MnGe and Co2MnSi in the presence of intrinsic defects (such as stoichiometric atomic swaps as well as non-stoichiometric antisites) and when interfaced with GaAs and Ge. Our findings show that Mn antisites, due to their low formation energies, can easily occur, in excellent consistency with experimental observations, and that they do not destroy half-metallicity. On the other hand, Co antisites, which also show a modest formation energy, give rise to defect states at the Fermi level. As for the [001]-ordered interfaces, we show that the strong hybridization in proximity to the junction gives rise to rather broad interface states that locally destroy half-metallicity. However, the bulk gaps (both in the minority spin channel for the Heusler alloy and for both spin channels in the semiconducting side) are fully recovered within a few layers away from the junction.
机译:半金属全赫斯勒合金代表了自旋电子学应用中有希望的一类材料。但是,(i)Heusler化合物的本征点缺陷可能对费米能级的100%自旋极化有不利影响;(ii)当加入主流半导体时,界面态的存在(会破坏半金属性)会降解他们的表现。在这里,我们概述了为探索这两个问题而进行的最新第一性原理计算。特别是,我们着重于在存在内在缺陷(例如化学计量原子交换以及非化学计量反位点)并且与GaAs和Ge接触时对Co2MnGe和Co2MnSi进行的从头算FLAPW计算。我们的发现表明,由于锰反位点形成能量低,很容易发生,与实验观察结果非常一致,并且不会破坏半金属性。另一方面,Co反位点也显示出适度的形成能,从而在费米能级产生缺陷态。对于[001]有序的界面,我们显示了在结附近的强杂交产生了相当广泛的界面状态,该状态局部破坏了半金属性。但是,体积间隙(既在Heusler合金的少数自旋通道中,又在半导体侧的两个自旋通道中)都在远离结的几层之内完全恢复了。

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