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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Characterization of deep level defects in TI6I4S single crystals by photo-induced current transient spectroscopy
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Characterization of deep level defects in TI6I4S single crystals by photo-induced current transient spectroscopy

机译:TI6I4S单晶中深层缺陷的光诱导电流瞬态光谱表征

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摘要

Defect levels in semi-insulating TI6I4S single crystals grown by the horizontal Bridgman technique have been characterized using photo-induced current transient spectroscopy (PICTS). These measurements revealed six electron traps located at (0.059 +/- 0.007), (0.13 +/- 0.012), (0.31 +/- 0.074), (0.39 +/- 0.019), (0.62 +/- 0.110), and (0.597 +/- 0.105). These defect levels are attributed to vacancies (V-I, V-S) and antisite defects (I-S, Tl-S, Tl-I) upon comparison to calculations of native defect energy levels using density functional theory and defects recently reported from photoluminescence and photoconductivity measurements.
机译:使用光感应电流瞬变光谱法(PICTS)对通过水平Bridgman技术生长的半绝缘TI6I4S单晶体中的缺陷水平进行了表征。这些测量结果显示六个电子陷阱位于(0.059 +/- 0.007),(0.13 +/- 0.012),(0.31 +/- 0.074),(0.39 +/- 0.019),(0.62 +/- 0.110)和( 0.597 +/- 0.105)。与使用密度泛函理论和最近从光致发光和光电导测量报告的缺陷进行计算得出的自然缺陷能级进行比较后,这些缺陷水平可归因于空位(V-I,V-S)和反位缺陷(I-S,T1-S,T1-1)。

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