Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

摘要

We propose an active multilayer mirror structure for extreme ultraviolet (EUV) wavelengths, which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure is possible. Finally piezoelectric coefficient measurement (d33 = 60 pm V~(-1)) of the film is presented.