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Microstructures, phases, and properties of low melting BaO-B _2O_3-ZnO glass films prepared by pulsed laser deposition

机译:脉冲激光沉积制备低熔点BaO-B _2O_3-ZnO玻璃薄膜的结构,相和性能

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摘要

With the motivation to employ BaO-B_2O_3-ZnO for high performance capacitors by using viscous flow/liquid phase sintering, the microstructures, phases, and dielectric properties of BaO-B_2O _3-ZnO films prepared by pulsed laser deposition were examined as a function of heat-treatment. The glass transition temperature (Tg) and crystallization temperature of the films are ~ 536 C and 640 C, respectively. The phases in the films are quite complicated after heat-treated above 700 C until 900 C where the film is dominated by a single phase. Zn concentration is reduced after heat-treatment at high temperature due to segregation and evaporation. The dielectric constant of the film decreases with the increasing heat-treatment temperature, probably due to Zn reduction, Si diffusion, and crystallization of the film. Experimental data shows that ~ 700 C is the optimal temperature to use the low melting glass BaO-B_2O_3-ZnO to make high performance capacitors by viscous flow/liquid phase sintering.
机译:为了通过粘性流/液相烧结将BaO-B_2O_3-ZnO应用于高性能电容器,研究了通过脉冲激光沉积制备的BaO-B_2O _3-ZnO薄膜的微观结构,相和介电性能,并以此作为函数。热处理。薄膜的玻璃化转变温度(Tg)和结晶温度分别约为536 C和640C。在高于700℃的温度下热处理直至900℃后,膜中的相非常复杂,在900℃下,膜以单相为主。高温热处理后,由于偏析和蒸发,锌浓度降低。膜的介电常数随热处理温度的升高而降低,这可能是由于Zn的还原,Si扩散和膜的结晶所致。实验数据表明,约700℃是使用低熔点玻璃BaO-B_2O_3-ZnO通过粘性流/液相烧结制造高性能电容器的最佳温度。

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