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Metastability effects in hydrogenated microcrystalline silicon thin films investigated by the dual beam photoconductivity method

机译:双束光电导法研究氢化微晶硅薄膜的亚稳效应

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摘要

Metastability effects in microcrystalline silicon (μc-Si:H) thin films have been investigated using dark conductivity, σ _D, photoconductivity, σ _(ph), and sub-bandgap absorption methods. Nitrogen and inert gasses can cause reversible aging effect in conductivities but not in the sub-bandgap absorption. However, DI water and O _2 gas treatment result in both reversible and nonreversible effects in conductivities as well as in the sub-bandgap absorption. Only oxygen affected the dark conductivity reversibly in amorphous silicon, a-Si:H, films, other results were unaffected from the aging and annealing processes applied.
机译:已经使用暗电导率,σ_D,光电导率,σ_(ph)和子带隙吸收方法研究了微晶硅(μc-Si:H)薄膜中的亚稳态效应。氮气和惰性气体会在电导率中引起可逆的老化作用,但不会引起亚带隙吸收。但是,去离子水和O _2气体处理会导致电导率以及亚带隙吸收同时发生可逆和不可逆的作用。只有氧可逆地影响非晶硅,a-Si:H薄膜中的暗电导率,其他结果不受老化和退火工艺影响。

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