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Direct naho-in-micropatterning of TiO2 thin layers and TiO2/Pt nanoelectrode arrays by deep X-ray lithography

机译:深度X射线光刻技术直接对TiO2薄层和TiO2 / Pt纳米电极阵列进行微细化

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摘要

Nano-in-micro-patterned heterogeneous substrates and Pt electrodes are prepared via organic/ inorganic self-assembly combined with deep X-ray lithography. Nanoperforated titania membranes are obtained through dip coating from a sol-gel solution using block copolymer micelles as templating agent. Such thin films are selectively exposed to the X-ray radiation that leads to the structural local densification and permits the selective etching of the unexposed layer. Structural as well as electrochemical characterizations demonstrate that the final materials are micrometric features of a sub-10 nm thick perforated titania membrane that guarantees the accessibility to the substrate. This system was also applied to a conductive platinum-coated silicon surface to achieve micrometric features of nanoelectrode arrays. This scalable strategy of combining bottom-up and top-down approaches is thereby promising for various applications involving smart functional devices.
机译:通过有机/无机自组装与深X射线光刻技术相结合,制备了纳米微图案化的异质衬底和Pt电极。使用嵌段共聚物胶束作为模板剂,通过从溶胶-凝胶溶液浸涂获得纳米穿孔的二氧化钛膜。这样的薄膜被选择性地暴露于X射线辐射,该X射线辐射导致结构局部致密化并允许对未曝光层进行选择性蚀刻。结构和电化学特性表明,最终材料是亚10纳米厚的穿孔二氧化钛膜的微米级特征,可确保接近基材。该系统还应用于导电铂涂层的硅表面,以实现纳米电极阵列的微米特征。因此,这种自下而上和自上而下的方法相结合的可扩展策略对于涉及智能功能设备的各种应用是有前途的。

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