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首页> 外文期刊>Journal of nanoscience and nanotechnology >Scale Effects on Stiction-Induced Release Voltage Shift of Nano-Electromechanical (NEM) Memory Cells
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Scale Effects on Stiction-Induced Release Voltage Shift of Nano-Electromechanical (NEM) Memory Cells

机译:尺度效应对纳米机电(NEM)存储单元静摩擦诱发的释放电压偏移的影响

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摘要

In order to overcome the limits of conventional flash memory, nonvolatile nano-electromechanical (NEM) memory has been proposed. The release voltage shift of a NEM memory cell induced by beam stiction has been studied by using one-dimensional analytical model and three-dimensional finite element analysis (FEA) simulation. As the size of a NEM memory cell decreases, stiction effects become more severe because the spring force becomes weaker. The influence of NEM memory cell scaling on release voltage shift has been discussed. If all geometrical dimensions are scaled in proportion, which is called general scaling, release voltage shift becomes larger, and release voltage becomes smaller. Then, if release voltage shift becomes larger than release voltage as general scaling continues, NEM memory cells do not work due to the permanently pulled-in cantilever beam. In order to prevent this, it is necessary to reduce beam length aggressively compared with other dimension scaling or to introduce more elastic and less adhesive beam material than existing beam material.
机译:为了克服常规闪存的限制,已经提出了非易失性纳米机电(NEM)存储器。通过使用一维分析模型和三维有限元分析(FEA)仿真,研究了由于束粘而引起的NEM存储单元的释放电压偏移。随着NEM存储单元的尺寸减小,由于弹簧力变弱,因此粘着效应变得更严重。已经讨论了NEM存储单元缩放对释放电压偏移的影响。如果所有几何尺寸均按比例缩放,这称为通用缩放,则释放电压偏移会变大,释放电压会变小。然后,如果随着通用缩放继续进行,释放电压偏移变得大于释放电压,则NEM存储单元由于永久拉入的悬臂梁而无法工作。为了防止这种情况,与其他尺寸缩放相比,必须积极减少光束长度,或者比现有的光束材料引入更多的弹性和更少的粘合光束材料。

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