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A facile method for the production of SnS thin films from melt reactions

机译:一种由熔融反应生产SnS薄膜的简便方法

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摘要

Tin(II)O-ethylxanthate [Sn(S2COEt)(2)] was prepared and used as a single-source precursor for the deposition of SnS thin films by a melt method. Polycrystalline, (111)-orientated, orthorhombic SnS films with controllable elemental stoichiometries (of between Sn1.3S and SnS) were reliably produced by selecting heating temperatures between 200 and 400 A degrees C. The direct optical band gaps of the SnS films ranged from 1.26 to 1.88 eV and were strongly influenced by its Sn/S ratio. The precursor [Sn(S2COEt)(2)] was characterized by thermogravimetric analysis and attenuated total reflection Fourier-transform infrared spectroscopy. The as-prepared SnS films were characterized by scanning electron microscopy, energy-dispersive X-ray spectroscopy, powder X-ray diffractometry, Raman spectroscopy, and UV-Vis spectroscopy.
机译:制备了锡(II)O-乙基黄原酸酯[Sn(S2COEt)(2)],并用作通过熔融法沉积SnS薄膜的单源前驱体。通过选择200至400 A摄氏度之间的加热温度,可以可靠地生产具有可控元素化学计量(在Sn1.3S和SnS之间)的多晶,(111)取向的正交SnS薄膜。SnS薄膜的直接光学带隙范围为1.26至1.88 eV,并受其Sn / S比的强烈影响。前驱体[Sn(S2COEt)(2)]通过热重分析和衰减全反射傅里叶变换红外光谱进行表征。通过扫描电子显微镜,能量色散X射线光谱,粉末X射线衍射法,拉曼光谱和UV-Vis光谱对所制备的SnS膜进行表征。

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