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Effective p-type N-doped WS2 monolayer

机译:有效的p型N掺杂WS2单层

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摘要

Based on density functional theory, the characteristics of n- and p-type dopants are investigated by means of group V and VII atoms substituting sulfur in the WS2 monolayer. Numerical results show that for each doping case, the formation energy is lower under W-rich condition, which indicates that it is energy favorable to incorporate group V and VII atoms into WS2 under W-rich experimental conditions. Moreover, compared with other dopant cases, N-doped WS2 monolayer owns the lowest formation energy. In particular, the transition level of (-1/0) is only 75 meV in the N-doped case, which indicates that N impurities can offer effective p-type carriers in the WS2 monolayer. (C) 2015 Elsevier B.V. All rights reserved.
机译:基于密度泛函理论,通过WS2单层中的V和VII原子取代硫来研究n型和p型掺杂剂的特性。数值结果表明,对于每种掺杂情况,在富W条件下形成能都较低,这表明在富W实验条件下将V和VII族原子掺入WS2是有利的能量。此外,与其他掺杂物相比,N掺杂WS2单层拥有最低的形成能。特别地,在N掺杂的情况下(-1/0)的跃迁电平仅为75 meV,这表明N杂质可以在WS2单层中提供有效的p型载流子。 (C)2015 Elsevier B.V.保留所有权利。

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