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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >A study on electrical transport vis-a-vis the effect of thermal annealing on the p-type conductivity in arsenic-doped MOCVD grown ZnO in the temperature range 10-300 K
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A study on electrical transport vis-a-vis the effect of thermal annealing on the p-type conductivity in arsenic-doped MOCVD grown ZnO in the temperature range 10-300 K

机译:相对于10-300 K温度范围内砷掺杂MOCVD生长的ZnO中电退火对热退火对p型电导率的影响的研究

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Arsenic-doped p-type ZnO films were grown by MOCVD on semi-insulating GaAs substrates followed by thermal annealing. In order to study the dependence of charge transport on doping concentration, the carrier concentration in the films were varied by varying the post-deposition annealing temperature. The doped films showed p-type conductivity at room temperature with carrier concentration 4.5 × 10~(18)cm~(-3) (Sample A), 2.8 × 10~(19)cm~(-3) (Sample B) and 5.7 × 10~(19)cm~(-3) (Sample C) annealed, respectively, at 650 °C, 700 °C and 750 °C in oxygen ambient. To investigate the temperature dependent charge transport mechanism in the films, the dc conductivity has been measured over a wide range of temperature from 300 K down to 10 K. The experimental data for the films were found to follow the Mott's variable range hopping (M-VRH) type of conduction in the lower temperature region, whereas, in the higher temperature region the conductivity is governed by the thermally activated (TA) type of band conduction. It is found that for sample A, M-VRH is observed in the temperature 10-52 K whereas this upper-end temperature is reduced when the samples are annealed at higher temperatures. Thus for samples B and C, M-VRH is observed at 10-41 K and 10-35 K, respectively. On the other hand, TA type of conduction is observed in the temperature range 130-300 K, 116-300 K and 110-300 K for samples A, B and C, respectively. The decrease in the onset temperature for TA type of conduction with the increase in carrier concentration is due to high density of acceptor impurity levels close to the valence band, which facilitates the band conduction at a comparatively lower temperature. On the other hand, the average dis tance between the localized states near the Fermi level at low temperatures is comparatively small for high carrier concentration facilitating the M-VRH transport.
机译:通过MOCVD在半绝缘的GaAs衬底上生长掺砷的p型ZnO薄膜,然后进行热退火。为了研究电荷传输对掺杂浓度的依赖性,通过改变沉积后的退火温度来改变膜中的载流子浓度。掺杂的薄膜在室温下表现出p型导电性,载流子浓度为4.5×10〜(18)cm〜(-3)(样品A),2.8×10〜(19)cm〜(-3)(样品B)和在氧气环境下,分别在650°C,700°C和750°C下对5.7×10〜(19)cm〜(-3)(样品C)进行退火。为了研究薄膜中与温度相关的电荷传输机制,在300 K至10 K的宽温度范围内测量了直流电导率。发现薄膜的实验数据遵循Mott的可变范围跳跃(M- VRH)类型的导电在较低温度区域中进行,而在较高温度区域,导电性由热激活(TA)类型的带导控制。发现对于样品A,在10-52K的温度下观察到M-VRH,而当样品在较高温度下退火时,该上限温度降低。因此,对于样品B和C,分别在10-41 K和10-35 K观察到M-VRH。另一方面,对于样品A,B和C,分别在130-300 K,116-300 K和110-300 K的温度范围内观察到TA型导电。 TA型传导的起始温度随载流子浓度的增加而降低是由于靠近价带的高浓度的受主杂质浓度,这有助于在相对较低的温度下进行能带传导。另一方面,在低温下费米能级附近的局部状态之间的平均距离相对较小,这是因为高载流子浓度促进了M-VRH的运输。

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