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Grain growth kinetics and magnetic properties of NiZn ferrite thin films

机译:NiZn铁氧体薄膜的晶粒生长动力学和磁性

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摘要

This paper focuses on the grain growth kinetics described by tradition phenomenological rate equation through nonlinear fitting of grain sizes for Ni_(0.5)Zn_(0.5)Fe_2O_4 ferrite thin films. The grain growth exponent n, which matches with normal grain growth, equals to 2.43 at 600 °C, and the process is controlled by anomalous solute drag which effects on the grain boundary mobility. As the annealing temperature rises from 700 °C to 900 °C, correspondingly the n goes up from 3 to 4, indicating that volume diffusion happens. The activation energy for grain growth are 22.75, 42.52, 56.32 and 85.54 kJ/mol from 600 °C to 900 °C, respectively, they are much smaller than that of the NiZn ferrite bulk. The effects of annealing temperature on the magnetic properties, phase structure and microstructure are investigated. The coercivity of NiZn ferrite thin films is mainly discussed via stress model.
机译:通过非线性拟合Ni_(0.5)Zn_(0.5)Fe_2O_4铁氧体薄膜的晶粒尺寸,研究了传统现象速率方程所描述的晶粒生长动力学。与正常晶粒长大相匹配的晶粒长大指数n在600°C时等于2.43,并且该过程受反常溶质拖曳的控制,该拖曳对晶界迁移率有影响。随着退火温度从700°C上升到900°C,n相应地从3上升到4,这表明发生了体积扩散。从600°C到900°C,晶粒生长的活化能分别为22.75、42.52、56.32和85.54 kJ / mol,远小于NiZn铁氧体块体的活化能。研究了退火温度对磁性能,相结构和微观结构的影响。主要通过应力模型讨论了NiZn铁氧体薄膜的矫顽力。

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