首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Perpendicular magnetic anisotropy in 70 nm CoFe_2O_4 thin films fabricated on SiO_2/Si(100) by the sol-gel method
【24h】

Perpendicular magnetic anisotropy in 70 nm CoFe_2O_4 thin films fabricated on SiO_2/Si(100) by the sol-gel method

机译:溶胶-凝胶法在SiO_2 / Si(100)上制备的70 nm CoFe_2O_4薄膜中的垂直磁各向异性

获取原文
获取原文并翻译 | 示例
           

摘要

Cobalt ferrite CoFe_2O_4 films were fabricated on SiO_2/Si(l 00) by the sol-gel method. Films crystallized at/above 600 °C are stoichiometric as expected. With increase of the annealing temperature from 600 °C to 750 °C, the columnar grain size of CoFe_2O_4 film increases from 13 nm to 50 nm, resulting in surface roughness increasing from 0.46 nm to 2.55 nm. Magnetic hysteresis loops in both in-plane and out-of-plane directions, at different annealing temperatures, indicate that the films annealed at 750 °C exhibit obvious perpendicular magnetic anisotropy. Simultaneously, with the annealing temperature increasing from 600 °C to 750 °C, the out of plane coercivity increases from 1 kOe to 2.4 kOe and the corresponding saturation magnetization increases from 200 emu/cm~3 to 283 emu/cm3. In addition, all crystallized films exhibit cluster-like structured magnetic domains.
机译:采用溶胶-凝胶法在SiO_2 / Si(l 00)上制备了钴铁氧体CoFe_2O_4薄膜。在600°C / 600°C以上结晶的膜符合预期的化学计量。随着退火温度从600°C增加到750°C,CoFe_2O_4膜的柱状晶粒尺寸从13 nm增加到50 nm,导致表面粗糙度从0.46 nm增加到2.55 nm。在不同的退火温度下,面内和面外方向的磁滞回线表明,在750°C退火的薄膜表现出明显的垂直磁各向异性。同时,随着退火温度从600°C增加到750°C,面外矫顽力从1 kOe增加到2.4 kOe,相应的饱和磁化强度从200 emu / cm〜3增加到283 emu / cm3。另外,所有结晶的膜均表现出簇状结构的磁畴。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号