Lateral parameter variations on the properties of La_(0.7)Sr_(0.3)MnO_3 films prepared on Si (1 0 0) substrates by dc magnetron sputtering

摘要

La_(0.7)Sr_(0.3)MnO_3 (LSMO) is an interesting colossal magnetoresistance material for application in electronic and spintronics devices. A phenomenon in the planner magnetron sputtering of the LSMO films that is not well investigated as yet are the laterally non-uniform film properties resulting from the laterally inhomogeneous erosion of the target material, whereby the lateral distribution of the film properties depend strongly on the deposition parameters. The lateral distributions of the electrical, magnetic and structural properties ofLSMOfilms prepared by dc magnetron sputtering on Si substrates are investigated across a distance of 64mmusing four-point probe, vibrating sample magnetometer and X-ray diffraction.In room temperature the T_(MI) and T_c of this film without any additional buffer layer are 245K and 325 K,respectively, which makes them very interesting as spin source in Si based technology. Hence, it seems that sputter deposited LSMO is a promising CMR materials for spintronics devices.