首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Physical and dielectric properties of sol-gel derived ZnO-doped Zr_(0.8)Sn_(0.2)TiO_4 dielectric thin films
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Physical and dielectric properties of sol-gel derived ZnO-doped Zr_(0.8)Sn_(0.2)TiO_4 dielectric thin films

机译:溶胶凝胶衍生ZnO掺杂Zr_(0.8)Sn_(0.2)TiO_4介电薄膜的物理和介电性能

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摘要

Electrical properties, optical properties and microstructures of 1 wt% ZnO-doped (Zr_(0.8)Sn_(0.2))TiO_4 thin films prepared by the sol-gel method on ITO substrates at different heat-treatment temperatures have been investigated. All films exhibited ZST (111) and (101) orientations perpendicular to the substrate surface and the grain size increased with increasing heat-treatment temperature. Optical transmittance spectroscopy further revealed high transparency (over 80%) in the visible region of the spectrum. At a heat-treatment temperature level of 250 °C, the ZnO-doped (Zr_(0.8)Sn_(0.2))TiO_4 films were found to possess a dielectric constant of 18 (at 1 MHz), a dissipation factor of 0.24 (at 1 MHz) and a leakage current density of 8.7 x 10~(-9) A/cm~2 at an electrical field of 50 V/cm.
机译:研究了通过溶胶-凝胶法在不同热处理温度下制备的1 wt%ZnO掺杂的(Zr_(0.8)Sn_(0.2))TiO_4薄膜的电学性质,光学性质和微观结构。所有薄膜均表现出垂直于基材表面的ZST(111)和(101)取向,并且晶粒尺寸随热处理温度的升高而增加。光学透射光谱进一步揭示了在光谱的可见光区域中的高透明度(超过80%)。在250°C的热处理温度下,发现掺杂ZnO的(Zr_(0.8)Sn_(0.2))TiO_4膜的介电常数为18(在1 MHz下),耗散系数为0.24(在1 MHz)和50 V / cm电场下的泄漏电流密度为8.7 x 10〜(-9)A / cm〜2。

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