首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Modeling Graphene with Nanoholes: Structure and Characterization by Raman Spectroscopy with Consideration for Electron Transport
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Modeling Graphene with Nanoholes: Structure and Characterization by Raman Spectroscopy with Consideration for Electron Transport

机译:带有纳米孔的石墨烯建模:考虑电子传输的拉曼光谱结构和表征

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摘要

Recent advances in controlled synthesis and characterization of single-layer graphene nanostructures with defects provide the basis for gaining an understanding of the complex nanomaterials by theoretical investigation. In this work, we modeled defective single-layer graphene (DSLG), where nanostructures with divacancy, trivacancy, tetravacancy, pentavacancy, hexavacancy, and heptavacancy defects, having pore sizes from 0.1 to 0.5 nm, were considered. Nanostructures with molecular oxygen adsorption to mimic experimental conditions were also investigated. On the basis of calculated formation energies of the optimized nanostructures, a few DSLGs were selected for theoretical characterization of the defect-induced I(D)/I(D') Raman intensity ratios. We found that the I(D)/I(D') ratio decreases with an increase in the nanohole size and in the number of adsorbed oxygens, which explains an experimental observation of a decrease in this characterization signature with an increase in exposure time to oxygen plasma. The predicted ratio was also confirmed by Raman spectroscopy measurements for graphene oxide quantum dots. The results were rationalized based on an analytical analysis of the D' band electron-defect matrix elements. Finally, consideration of patterned graphene nanostructures with vacancies for field effect transistor (FET) application was shown to provide a route to bandgap generation, and potentially improvement of the I-on/I-off ratio in a FET by nanohole passivation, e.g., by hydrogenation. FETs based on patterned graphene with small pores could have a similar high level of performance as graphene nanoribbons, however with the added benefit of no width confinement.
机译:具有缺陷的单层石墨烯纳米结构的受控合成和表征的最新进展为通过理论研究了解复杂的纳米材料提供了基础。在这项工作中,我们对有缺陷的单层石墨烯(DSLG)进行建模,其中考虑了具有空位,三空位,四空位,五空位,六空位和七空位缺陷的纳米结构,其孔径为0.1至0.5 nm。还研究了分子氧吸附模拟实验条件的纳米结构。基于优化的纳米结构的计算形成能,选择了一些DSLGs用于缺陷诱导的I(D)/ I(D')拉曼强度比的理论表征。我们发现I(D)/ I(D')比随着纳米孔尺寸和吸附氧数量的增加而降低,这解释了实验观察到这种表征特征随着暴露时间的延长而降低。氧等离子体。通过拉曼光谱测量法对氧化石墨烯量子点也证实了预测的比率。基于对D'带电子缺陷基质元素的分析分析,使结果合理化。最后,对具有空位的图案化石墨烯纳米结构进行考虑以用于场效应晶体管(FET)的应用已显示出提供带隙生成的途径,并可能通过纳米孔钝化(例如,通过纳米孔钝化)提高FET中的I-on / I-off比。氢化。基于具有小孔的图案化石墨烯的FET可以具有与石墨烯纳米带类似的高水平性能,但是具有不限制宽度的额外好处。

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