首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Ab Initio Study of H2 Associative Desorption on Ad-Dimer Reconstructed Si(001) and Ge(001)-(2x1) Surfaces
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Ab Initio Study of H2 Associative Desorption on Ad-Dimer Reconstructed Si(001) and Ge(001)-(2x1) Surfaces

机译:Ad-二聚体重构的Si(001)和Ge(001)-(2x1)表面上H2缔合解吸的从头算研究

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摘要

We investigate the pathways of hydrogen migration and associative desorption of H2 on the Si(001) and Ge(001)-(2x1) reconstructed surfaces with adsorbed ad-dimers, using density functional theory methods. Although the trends obtained with common semilocal exchange—correlation functionals such as the generalized gradient approximation are correct, we show that the use of exact short-range Fock exchange in the calculations (by means of hybrid functionals) strongly affects the magnitude of the desorption barriers, especially for Ge surfaces, leading to a better estimate of the desorption temperatures. Our results for H2 desorption kinetic barriers are well-supported experimentally and can therefore help to elucidate the mechanisms driving atomic layer epitaxy growth processes.
机译:我们使用密度泛函理论方法研究了Si(001)和Ge(001)-(2x1)重构表面与吸附的二聚体的氢迁移和H2的缔合解吸的途径。尽管使用常见的半局部交换-相关函数(如广义梯度逼近)获得的趋势是正确的,但我们表明,在计算中使用精确的短距离Fock交换(通过混合函数)会严重影响解吸屏障的强度,特别是对于Ge表面,可以更好地估计解吸温度。我们对H2解吸动力学障碍的研究结果得到了实验的充分支持,因此可以帮助阐明驱动原子层外延生长过程的机制。

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